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    PROCESS FOR THE PREPARATION OF A QUELATING AGENT
    2.
    发明公开
    PROCESS FOR THE PREPARATION OF A QUELATING AGENT 审中-公开
    制备一种脱模剂的方法

    公开(公告)号：EP3183967A1

    公开(公告)日：2017-06-28

    申请号：EP15382657.3

    申请日：2015-12-22

    申请人： Trade Corporation International, S.A. Unipersonal

    发明人： VICENTE MATILLA, Rebeca ,  BLASCO BARRIO, José María

    IPC分类号： A01N47/00 ,  C07F15/02 ,  C07C227/14 ,  C07C229/42

    CPC分类号： C07C229/36 ,  A01N37/44 ,  C05D9/02 ,  C07C227/14 ,  A01N59/16

    摘要： It is provided a compound of formula (I');

    wherein R 5 is selected from the group consisting of -H, -OM, -COOM, -NH 2 , - SO 3 M, (C 1 -C 4 )alkyl, and halogen; and A is a radical having at least 3 C atoms selected from the group consisting of:
    i) a radical of formula (i)

    wherein R 7 is selected from the group consisting of -OM, and -COOM, and n is 0, 1 or 2; and
    ii) a radical of formula (ii) or of formula (iii)

    wherein R 8 is selected from the group consisting of -H, (C 1 -C 4 )alkyl; and wherein M is independently selected from the group consisting of H, an alkaly metal, and NH 4 + . It is also provided a process for the preparation thereof, a composition comprising it, and its use for correcting deficiencies of metals in plants.

    摘要翻译： 提供了式（I'）的化合物; 其中R 5选自-H，-OM，-COOM，-NH 2，-SO 3 M，（C 1 -C 4）烷基和卤素; 并且A是具有至少3个C原子的基团，所述基团选自：i）式（i）的基团，其中R 7选自-OM和-COOM，并且n是0,1或1。 2; 和ii）式（ii）或式（iii）的基团，其中R 8选自-H，（C 1 -C 4）烷基; 并且其中M独立地选自由H，烷基金属和NH 4 +组成的组。 还提供了其制备方法，包含其的组合物，及其用于纠正植物中金属缺陷的用途。

    PROCESS FOR THE PREPARATION OF A QUELATING AGENT
    3.
    发明公开
    PROCESS FOR THE PREPARATION OF A QUELATING AGENT 审中-公开

    公开(公告)号：EP3714695A1

    公开(公告)日：2020-09-30

    申请号：EP20169696.0

    申请日：2016-12-21

    申请人： Trade Corporation International, S.A. Unipersonal

    发明人： Vicente Matilla, Rebeca ,  Blasco Barrio, José María

    IPC分类号： A01N47/00 ,  C07F15/02 ,  C07C227/14 ,  C07C229/42 ,  A01N37/44

    摘要： It is provided a process for the preparation of a compound of formula (I)

    wherein R 1 is selected from the group consisting of H, -OM, -CH 3 , -COOM, -CH 2 OH, -CH(CH 3 )(OH), and -NH 2 ;
    R 2 is selected from the group consisting of -H, -OM, -COOM, -NH 2 , -CH 3 CH(NH 2 )(CH 2 ) 3 OH, -NH 2 (CH 2 ) m COOM, -CONH 2 , -NHC(NH 2 ) 2 , -SH, -SCH 3 , -CH(CH 3 ) 2 , -CH(CH 3 )(OH), -CH(CH 3 )(CHCH 2 CH 3 ), -PhOH, -Ph,

    and
    -NH 2 (CH 2 ) m OM, wherein m is 1 or 2;
    R 3 , R 4 , R 5 , and R 6 are independently selected from the group consisting of -H, -OM, -COOM, -NH 2 , -SO 3 M, (C 1 -C 4 )alkyl, and halogen;
    wherein M is independently selected from the group consisting of H, an alkali metal and NH 4 + , and n is 0 to 1,
    the process comprising reacting a compound of formula (II)

    wherein R 3 , R 4 , R 5 , and R 6 are as defined above,
    with a compound of formula (III)

    wherein R 1 , R 2 and n are as defined above,
    and glyoxylic acid or a salt thereof in the presence of a base, without the addition of an organic solvent, and in the presence of an amount of water from 1 to 13.3 mol for each mol of glyoxylic acid.