ELEKTRONENSTRAHLANLAGE
    1.
    发明授权
    ELEKTRONENSTRAHLANLAGE 失效
    电子厂

    公开(公告)号:EP0826221B1

    公开(公告)日:2001-10-17

    申请号:EP97908209.6

    申请日:1997-03-10

    发明人: KAMPMEIER, Franz

    IPC分类号: G21K5/10

    摘要: Described is an electron bombardment installation for curing plastic coatings on workpieces, the installation having a workpiece-irradiation chamber (2), an electron gun (3), a conveyor (4) to convey the workpieces into the workpiece-irradiation chamber, and a shield (8) to provide protection against radiation. In order to ensure a high workpiece throughput and good shielding, the installation is fitted with two or more locking devices (26) which can be moved with respect to the direction in which the workpieces are being conveyed and which are located on the conveyor, before and after the workpiece-irradiation chamber, for radiation-protection purposes, the distance along the conveyor between the locking devices being such that at least on workpiece fits between two locking devices.