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公开(公告)号：EP2872687B1
公开(公告)日：2018-05-09
申请号：EP13742257.2
申请日：2013-07-08
CPC分类号： D06M10/005 , B08B7/0042 , B23K26/0006 , B23K26/0096 , B23K26/032 , B23K26/0622 , B23K26/0648 , B23K26/0738 , B23K26/082 , B23K26/352 , B23K26/354 , B23K2101/34 , B23K2103/38 , B23K2103/40 , B23K2103/42 , B23K2103/50 , D06F75/00 , D06F75/02 , D06F75/08 , D06F75/14 , D06F75/20 , D06F75/22 , D06L4/00
摘要： Disclosed are methods and apparatus for cleaning a substrate involving the application of optical energy to the substrate, typically in the form of a beam of light, where the energy of the beam causes removal of the contaminant from substrate. The cleaning may occur via any mechanism, including one or more of, alone or in any combination, ablation, melting, heating or reaction with the substrate or contaminant or agent introduced to aid in the cleaning. The optical energy is typically applied to a selected area of the substrate (e.g., as a beam), and the substrate and beam or optical energy source moved relative to one another so as to clean a larger area of the substrate, either by moving the substrate or the beam, or both. Movement of the beam with respect to the substrate can be attained through a beam scanning mechanism or through movement of the optical source itself.
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2.发明公开METHODS AND APPARATUS FOR LASER CLEANING OF FABRIC MATERIALS 有权VERFAHREN UND VORRICHTUNG ZUR LASERREINIGUNG VON GEWEBEN
公开(公告)号：EP2872687A2
公开(公告)日：2015-05-20
申请号：EP13742257.2
申请日：2013-07-08
CPC分类号： D06M10/005 , B08B7/0042 , B23K26/0006 , B23K26/0066 , B23K26/0081 , B23K26/0096 , B23K26/032 , B23K26/0622 , B23K26/0648 , B23K26/0738 , B23K26/082 , B23K2201/34 , B23K2203/38 , B23K2203/40 , B23K2203/42 , B23K2203/50 , D06F75/00 , D06F75/14 , D06L4/00
摘要： Disclosed are methods and apparatus for cleaning a substrate, such as a fabric material, involving the application of optical energy to the substrate, typically in the form of a beam of light, where the energy of the beam causes removal of the contaminant from substrate, such as from the fibres of a fabric material. The cleaning may occur via any mechanism, including one or more of, alone or in any combination, ablation, melting, heating or reaction with the substrate or contaminant or agent introduced to aid in the cleaning. The optical energy is typically applied to a selected area of the substrate (e.g., as a beam), and the substrate and beam or optical energy source moved relative to one another so as to clean a larger area of the substrate, either by moving the substrate or the beam, or both. Movement of the beam with respect to the substrate can be attained through a beam scanning mechanism or through movement of the optical source itself.
摘要翻译： 公开了用于清洁衬底（例如织物材料）的方法和装置，其涉及将光能施加到衬底，通常以光束的形式，其中光束的能量引起从衬底去除污染物， 例如来自织物材料的纤维。 清洁可以通过任何机制实现，包括单独或以任何组合的一种或多种，与引入以帮助清洁的底物或污染物或试剂的消融，熔化，加热或反应。 光能通常被施加到衬底的选定区域（例如，作为光束），并且衬底和光束或光能源相对于彼此移动，以便清洁衬底的较大面积，无论是通过移动 衬底或光束，或两者。 光束相对于衬底的移动可以通过光束扫描机构或通过光源本身的移动来实现。
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公开(公告)号：EP3388573A1
公开(公告)日：2018-10-17
申请号：EP18171150.8
申请日：2013-07-08
发明人： CLOWES, John Redvers
CPC分类号： D06M10/005 , B08B7/0042 , B23K26/0006 , B23K26/0096 , B23K26/032 , B23K26/0622 , B23K26/0648 , B23K26/0738 , B23K26/082 , B23K26/352 , B23K26/354 , B23K2101/34 , B23K2103/38 , B23K2103/40 , B23K2103/42 , B23K2103/50 , D06F75/00 , D06F75/02 , D06F75/08 , D06F75/14 , D06F75/20 , D06F75/22 , D06L4/00
摘要： Disclosed are methods and apparatus for cleaning a substrate involving the application of optical energy to the substrate, typically in the form of a beam of light, where the energy of the beam causes removal of the contaminant from substrate. The cleaning may occur via any mechanism, including one or more of, alone or in any combination, ablation, melting, heating or reaction with the substrate or contaminant or agent introduced to aid in the cleaning. The optical energy is typically applied to a selected area of the substrate (e.g., as a beam), and the substrate and beam or optical energy source moved relative to one another so as to clean a larger area of the substrate, either by moving the substrate or the beam, or both. Movement of the beam with respect to the substrate can be attained through a beam scanning mechanism or through movement of the optical source itself.
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公开(公告)号：EP4157579A1
公开(公告)日：2023-04-05
申请号：EP21729241.6
申请日：2021-05-21
IPC分类号： B23K26/082 , B08B7/00 , B23K26/36 , B23K26/70 , B23K26/362
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公开(公告)号：EP3094423A1
公开(公告)日：2016-11-23
申请号：EP15701568.6
申请日：2015-01-08
发明人： CLOWES, John Redvers
IPC分类号： B08B7/00
CPC分类号： B08B7/0042
摘要： A method of cleaning a substrate (16, 24, 34, 64, 71, 82, 102, 165, 171, 181, 201, 300, 310) with optical energy can comprise applying optical energy from a source of optical energy (12, 21, 31, 91, 103, 114, 121, 131, 141, 151, 164, 191, 202) to the substrate. The method can comprise applying the optical energy to a substrate having a cleaning agent applied thereto, the optical energy having one or more optical parameters selected for cleaning the substrate. A cleaning appliance can comprise an appliance body (80, 90, 104, 125) comprising an aperture for emanating optical energy for cleaning the substrate and an optical transmission pathway arranged for propagating optical energy received from an optical energy source to said aperture. The appliance can be adapted and constructed for delivering a cleaning agent to the substrate. The cleaning appliance can include a suction pump (142) for removing material from the substrate.
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