VERFAHREN ZUM AUFBRINGEN EINER SCHUTZSCHICHT, SCHUTZSCHICHT SELBST UND HALBFABRIKAT MIT EINER SCHUTZSCHICHT
    5.
    发明公开
    VERFAHREN ZUM AUFBRINGEN EINER SCHUTZSCHICHT, SCHUTZSCHICHT SELBST UND HALBFABRIKAT MIT EINER SCHUTZSCHICHT 审中-公开
    VERFAHREN ZUM AUFBRINGEN EINER SCHUTZSCHICHT,SCHUTZSCHICHT SELBST UND HALBFABRIKAT MIT EINER SCHUTZSCHICHT

    公开(公告)号:EP3198660A1

    公开(公告)日:2017-08-02

    申请号:EP15797002.1

    申请日:2015-09-28

    申请人: Heliatek GmbH

    IPC分类号: H01L51/48 H01L51/56

    摘要: The invention relates to a protective layer and to a method for applying the protective layer (4) during a continuous reel-to-reel method for producing a semi-finished product and a semi-finished product of an organic electronic component, comprising a layer stack (3) on a substrate film (2). The protective layer protects the layer stack prior to and during the final production from environmental influences and from the damages related to handling. The aim of the invention is to produce a protective layer and to provide a method for the production thereof, said method being simple, flexible and economical, and at the same time, the method and the protective layer themselves having as few disadvantageous effects as possible on the functional layers which are to be protected. Said aim is achieved in that a protective layer material which is at least temporarily fluid, and which can be cross-linked or hardened in the application phase, and which is compatible with the layer stack in the fluid and solid phase and also with the conditions during the reel-to-reel method, is applied in such a manner that a functional protective layer is produced.

    摘要翻译: 本发明涉及一种保护层和一种用于在用于制造有机电子部件的半成品和半成品的连续卷到卷方法期间施加保护层(4)的方法,所述方法包括层 在基底膜(2)上堆叠(3)。 在最终生产之前和期间,保护层由于环境影响和与处理有关的损害而保护层堆。 本发明的目的是生产保护层并提供其制造方法,所述方法简单,灵活且经济,并且同时该方法和保护层本身具有尽可能少的不利影响 在要被保护的功能层上。 所述目的是通过以下方式实现的,即保护层材料至少暂时是流体,并且可以在施加阶段交联或硬化,并且与流体相和固体相中的叠层相容并且还与条件 在卷到卷方法期间,以这样的方式施加功能保护层。