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    ION IMPLANTATION PROCESS AND ION IMPLANTED GLASS SUBSTRATES
    1.
    发明公开
    ION IMPLANTATION PROCESS AND ION IMPLANTED GLASS SUBSTRATES 审中-公开
    离子注入工艺和离子注入玻璃衬底

    公开(公告)号：EP3209623A1

    公开(公告)日：2017-08-30

    申请号：EP15786897.7

    申请日：2015-10-21

    申请人： AGC Glass Europe ,  Asahi Glass Company, Limited ,  Quertech Ingénierie

    发明人： NAVET, Benjamine ,  BOULANGER, Pierre ,  VENTELON, Lionel ,  BUSARDO, Denis ,  GUERNALEC, Frédéric

    IPC分类号： C03C23/00

    CPC分类号： C03C23/0055 ,  C23C14/48

    摘要： The invention concerns a process for increasing the scratch resistance of a glass substrate by implantation of simple charge and multicharge ions, comprising maintaining the temperature of the area of the glass substrate being treated at a temperature that is less than or equal to the glass transition temperature of the glass substrate, selecting the ions to be implanted among the ions of Ar, He, and N, setting the acceleration voltage for the extraction of the ions at a value comprised between 5 kV and 200 kV and setting the ion dosage at a value comprised between 10
    14 ions/cm² and 2,5 x 10
    17 ions/cm².The invention further concerns glass substrates comprising an area treated by implantation of simple charge and multicharge ions according to this process and their use for reducing the probability of scratching on the glass substrate upon mechanical contact.

    摘要翻译： 本发明涉及一种通过注入简单的电荷和多电荷离子来提高玻璃基片的耐刮擦性的方法，包括将待处理的玻璃基片的区域的温度保持在小于或等于玻璃化转变温度 在Ar，He和N的离子中选择要注入的离子，将用于提取离子的加速电压设置在5kV和200kV之间的值，并将离子剂量设置为一个值 包括在1014离子/平方厘米和2.5×1017离子/平方厘米之间。本发明还涉及玻璃基底，其包括根据该工艺通过植入简单电荷和多电荷离子进行处理的区域，以及它们用于降低刮擦玻璃的可能性 衬底机械接触。

    GLASS SUBSTRATE FOR CHEMICAL STRENGTHENING AND METHOD FOR CHEMICALLY STRENGTHENING WITH CONTROLLED CURVATURE
    3.
    发明公开
    GLASS SUBSTRATE FOR CHEMICAL STRENGTHENING AND METHOD FOR CHEMICALLY STRENGTHENING WITH CONTROLLED CURVATURE 审中-公开
    玻璃基板为化学品，具有控制曲线加强化学强化和方法

    公开(公告)号：EP3181533A1

    公开(公告)日：2017-06-21

    申请号：EP15201319.9

    申请日：2015-12-18

    申请人： AGC Glass Europe ,  Asahi Glass Company, Limited

    发明人： NAVET, Benjamine ,  BOULANGER, Pierre

    IPC分类号： C03C21/00 ,  C03C23/00

    CPC分类号： C03C21/002 ,  C03C23/0055

    摘要： The invention relates to a glass substrate for chemical strengthening where a side is treated by ion implantation so as to reduce the extent of ion exchange upon chemical strengthening. Other embodiments relate to a method for making a chemically strengthened glass substrate with controlled curvature comprising: providing a substrate having first and second opposing sides, wherein the substrate presents in the surface layer of at least part of the first side a first ion implantation profile that reduces the extent of ion exchange upon chemical strengthening and chemically strengthening the ion implantation treated glass substrate. The parameters of the ion implantation are chosen such that a controlled curvature is obtained upon chemical strengthening.

    摘要翻译： 本发明涉及其中的一侧通过离子注入处理，从而减少对化学强化的离子交换的程度的化学强化玻璃基片。 其它实施例涉及用于制造化学强化玻璃基片具有受控曲率的方法，包括：提供具有第一和第二相对侧面的基底，worin基板在所述第一侧面上的第一离子注入剖面做的至少一部分的表面层呈现 降低在化学强化和化学强化离子注入处理的玻璃基板的离子交换的程度。 离子注入的参数被选择的搜索没有受控的曲率在化学强化得到。