公开(公告)号：EP3449312A1

公开(公告)日：2019-03-06

申请号：EP17717149.3

申请日：2017-04-12

申请人： ASML Netherlands B.V.

发明人： NASALEVICH, Maxim, Aleksandrovich ,  ABEGG, Erik, Achilles ,  BANERJEE, Nirupam ,  BLAUW, Michiel, Alexander ,  BROUNS, Derk, Servatius, Gertruda ,  JANSSEN, Paul ,  KRUIZINGA, Matthias ,  LENDERINK, Egbert ,  MAXIM, Nicolae ,  NIKIPELOV, Andrey ,  NOTENBOOM, Arnoud, Willem ,  PILIEGO, Claudia ,  PÉTER, Mária ,  RISPENS, Gijsbert ,  SCHUH, Nadja ,  VAN DE KERKHOF, Marcus, Adrianus ,  VAN DER ZANDE, Willem, Joan ,  VAN ZWOL, Pieter-Jan ,  VERBURG, Antonius, Willem ,  VERMEULEN, Johannes, Petrus, Martinus, Bernardus ,  VLES, David, Ferdinand ,  VOORTHUIJZEN, Willem-Pieter ,  ZDRAVKOV, Alexandar, Nikolov

IPC分类号： G03F1/24 ,  G03F1/62 ,  G03F7/20

公开(公告)号：EP4260142A1

公开(公告)日：2023-10-18

申请号：EP21801146.8

申请日：2021-11-10

申请人： ASML Netherlands B.V.

发明人： BLAUW, Michiel, Alexander ,  DER KINDEREN, Ronny

IPC分类号： G03F7/20

公开(公告)号：EP4202545A1

公开(公告)日：2023-06-28

申请号：EP23157200.9

申请日：2017-04-12

申请人： ASML Netherlands B.V.

发明人： NASALEVICH, Maxim, Aleksandrovich ,  ABEGG, Erik, Achilles ,  BROUNS, Derk, Servatius, Gertruda ,  JANSSEN, Paul ,  KRUIZINGA, Matthias ,  NIKIPELOV, Andrey, ,  PÉTER, Mária ,  SCHUH, Nadja ,  VAN DE KERKHOF, Marcus, Adrianus ,  VAN DER ZANDE, Willem, Joan ,  VAN ZWOL, Pieter-Jan ,  VERBURG, Antonius, Willem ,  VERMEULEN, Johannes, Petrus, Martinus, Bernardus ,  VLES, David, Ferdinand ,  VOORTHUIJZEN, Willem-Pieter ,  BANERJEE, Nirupam ,  BLAUW, Michiel, Alexander ,  LENDERINK, Egbert ,  MAXIM, Nicolae ,  NOTENBOOM, Arnoud, Willem ,  PILIEGO, Claudia ,  RISPENS, Gijsbert ,  ZDRAVKOV, Alexandar, Nikolov

IPC分类号： G03F1/24 ,  G03F1/62 ,  G03F7/20 ,  G02B5/20 ,  G03B27/72 ,  G03F1/82

摘要： The invention concerns a membrane for EUV lithography. The membrane comprises a base layer. The base layer comprises one or more of the following: a stable stoichiometry of Mo and Si, a stable stoichiometry of Ru and Si, a stable stoichiometry of Zr and Si, a stable stoichiometry of La and Si, a stable stoichiometry of Y and Si, and a stable stoichiometry of Nb and Si. The membrane further comprises a capping layer providing an outer surface of the membrane. The invention further concerns a pellicle assembly comprising the membrane of the invention, a patterning device assembly comprising the pellicle assembly of the invention, and a dynamic gas lock assembly comprising the membrane of the invention.