专利检索 ap:("ASML Netherlands B.V.") AND inv:"KLUNDER, Derk , Jan, Wilfred" 第 1 页

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发明公开
LITHOGRAPHIC APPARATUS AND CLEANING METHOD THEREFOR 审中-公开
标题翻译：光刻设备和清洁及其方法

公开(公告)号：EP1891480A2

公开(公告)日：2008-02-27

申请号：EP06747569.9

申请日：2006-06-13

申请人： ASML Netherlands B.V.

发明人： VAN HERPEN, Maarten, Marinus, Johannes, Wilhelmus , BANINE, Vadim, Yevgenyevich , MOORS, Johannes, Hubertus, Josephina , KLUNDER, Derk , Jan, Wilfred

IPC分类号： G03F7/20

CPC分类号： G03F7/70925 , B82Y10/00 , G03F7/70166 , G03F7/70916

摘要： A lithographic apparatus is disclosed. The apparatus includes a source (5) for supplying hydrogen radicals (1), a guide (2) for use in conjunction with the source, for directing hydrogen radicals to an application surface (4) to be targeted by the hydrogen radicals. The guide is provided with a coating (8) having a hydrogen radical recombination constant of less than 0.2. In this way, the radicals can be transported with reduced losses and are able to better interact with remaining contaminants on application surfaces, such as mirror surfaces.