专利检索 ap:("ASML Netherlands B.V.") AND inv:"SIDELNIKOV, Yurii, Victorovitch" 第 1 页

1.

发明公开
EXTREME ULTRAVIOLET RADIATION SOURCE AND METHOD FOR PRODUCING EXTREME ULTRAVIOLET RADIATION 审中-公开
标题翻译：极端紫外辐射光源和方法，用于极紫外辐射的产生

公开(公告)号：EP2236014A1

公开(公告)日：2010-10-06

申请号：EP08868996.3

申请日：2008-12-19

申请人： ASML Netherlands B.V.

发明人： SIDELNIKOV, Yurii, Victorovitch , BANINE, Valdim, Yevgenyevich , KOSHELEV, Konstantin, Nikolaevich , FRIJNS, Olav, Waldemar, Vladimir , KRIVTSUN, Vladimir, Mihailovitch

IPC分类号： H05G2/00

CPC分类号： H05G2/003

摘要： A radiation source is constructed and arranged to produce extreme ultraviolet radiation. The radiation source includes a chamber, a first electrode at least partially contained in the chamber, a second electrode at least partially contained in the chamber, and a supply constructed and arranged to provide a discharge gas to the chamber. The first electrode and the second electrode are configured to create a discharge in the discharge gas to form a plasma so as to generate the extreme ultraviolet radiation. The source also includes a gas supply constructed and arranged to provide a gas at a partial pressure between about (1) Pa and about (10) Pa at a location near the discharge. The gas is selected from the group consisting of hydrogen, helium, and a mixture of hydrogen and helium.