公开(公告)号：EP0762158B1

公开(公告)日：2003-07-23

申请号：EP96305793.0

申请日：1996-08-07

申请人： AT&T Corp.

发明人： Aspell, Jennifer ,  Inniss, Daryl ,  Kuck, Valerie Jeanne ,  Paczkowski, Mark Anthony ,  Simoff, Debra Ann

IPC分类号： G02B6/16

CPC分类号： G02B6/02142 ,  G02B6/02133 ,  G02B6/02138 ,  G02B2006/02161 ,  Y10S430/162

公开(公告)号：EP0762158A1

公开(公告)日：1997-03-12

申请号：EP96305793.0

申请日：1996-08-07

申请人： AT&T Corp.

发明人： Aspell, Jennifer ,  Inniss, Daryl ,  Kuck, Valerie Jeanne ,  Paczkowski, Mark Anthony ,  Simoff, Debra Ann

IPC分类号： G02B6/16

CPC分类号： G02B6/02142 ,  G02B6/02133 ,  G02B6/02138 ,  G02B2006/02161 ,  Y10S430/162

摘要： Recognizing the rate-determining nature of the coating removal and recoating steps, applicants have demonstrated that with proper combination of low absorbing polymer, glass and low intensity radiation, UV-induced gratings can be side-written into polymer coated fibers without removing the polymer, thus permitting the possibility of high speed fabrication of fiber gratings.
FIG.2, which shows typical apparatus for practicing the method, includes a typical fiber (20) comprising a core (21), a cladding (22) surrounding the core, and an outer polymer coating (23).
UV light from laser (24) passes through mask (25) the polymer coating (23), and the cladding (22) to write a pattern of index changes along the photosensitive core (21). Alternatively, the pattern can be defined by two interfering beams of UV radiation. The UV radiation should be at a sufficiently low intensity that it does not seriously damage the polymer coating.
A methylsilsesquioxane-coated fiber treated with D 2 was exposed to UV light from a KrF excimer laser. An amplitude mask was used to produce long period gratings. The fiber was held taut to the amplitude mask, and its side adjacent to the mask was exposed to the UV radiation. At 130mJ/cm 2 1 dB loss developed at the selected wavelength after exposure for approximately 5 mintues. Examination of the fiber surface showed some physical damage to the polymer with periodicity comparable to the amplitude mask, but the coating remained intact and the damage appeared superficial. Decreasing the power to 100 mJ/cm 2 resulted in 0.5 dB loss, and minor damage to the surface of the polymer.

摘要翻译： 认识到涂层去除和重涂步骤的速率确定性质，申请人已经证明，通过适当组合低吸收聚合物，玻璃和低强度辐射，UV诱导光栅可以侧向写入聚合物涂覆的纤维中而不除去聚合物， 从而允许高速制造光纤光栅的可能性。 图2示出了用于实施该方法的典型装置，包括典型的纤维（20），其包括芯（21），围绕芯的包层（22）和外聚合物涂层（23）。 来自激光（24）的紫外光通过聚合物涂层（23）的掩模（25）和包层（22）沿着感光芯（21）写入折射率变化的图案。 或者，该图案可以由UV辐射的两个干涉光束来限定。 UV辐射应具有足够低的强度，使其不会严重损坏聚合物涂层。 用D2处理的甲基倍半硅氧烷涂覆的纤维暴露于来自KrF准分子激光的UV光。 使用幅度掩模来产生长周期光栅。 纤维被拉紧到幅面掩模上，并且其与掩模相邻的一侧暴露于UV辐射。 在暴露约5分钟后，在所选波长处产生130mJ / cm 2的1dB的损耗。 纤维表面的检查显示出与振幅掩模相当的周期性的聚合物的一些物理损伤，但是涂层保持完整并且损伤看起来是表面的。 将功率降低到100mJ / cm 2导致0.5dB的损耗，并且对聚合物的表面造成轻微损坏。