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公开(公告)号:EP3731000A1
公开(公告)日:2020-10-28
申请号:EP17935068.1
申请日:2017-12-27
发明人: WANG, Shuohong , LIN, Chunnan , WU, Chiatsung , KUO, Chiting , LEE, Kojui , LI, Chiahung , CHANG, Chiaming
IPC分类号: G02F1/1333
摘要: The metal structure comprises a patterned molybdenum-tantalum oxide layer and a patterned metal layer. The patterned molybdenum-tantalum oxide layer is provided on a first substrate, wherein the percentage content of tantalum atoms in the patterned molybdenum-tantalum oxide layer is between about 2% to 12%, and the percentage content of molybdenum atoms and the percentage content of oxygen atoms are both greater than the percentage content of the tantalum atoms. The patterned metal layer is provided on the patterned molybdenum-tantalum oxide layer.