METHOD AND APPARATUS FOR MEASURING PARAMETERS OF OPTICAL ANISOTROPY
    1.
    发明公开
    METHOD AND APPARATUS FOR MEASURING PARAMETERS OF OPTICAL ANISOTROPY 审中-公开
    VERFAHREN UND VORRICHTUNG ZUR PARAMETERMUNGUNG VON OPTISCHER ANISOTROPIE

    公开(公告)号:EP3052908A4

    公开(公告)日:2017-05-31

    申请号:EP14850913

    申请日:2014-10-03

    Applicant: AXOMETRICS INC

    CPC classification number: G01N21/21 G01N21/19 G01N21/23

    Abstract: Methods and systems are provided to measure the optical anisotropy properties of a film on glass or other substrates. This technique is suitable for production environments, and is not strongly affected by the TFT or CF active area on LCD panels, even for very high pixel density displays. A method is provided for measuring a magnitude and orientation of optical anisotropy. These methods and systems include an optical anisotropy measurement apparatus for measuring anisotropic materials in a reflection or transmission configuration. The methods and systems may measure a Mueller matrix, diattentuation orientation, or retardance of a sample at one or more rotation angles to calculate anisotropic magnitude and orientation.

    Abstract translation: 提供了用于测量玻璃或其他基底上的膜的光学各向异性特性的方法和系统。 该技术适用于生产环境,即使对于非常高像素密度的显示器,也不受LCD面板上的TFT或CF有源区域的强烈影响。 提供了一种用于测量光学各向异性的大小和取向的方法。 这些方法和系统包括用于测量反射或透射配置中的各向异性材料的光学各向异性测量设备。 该方法和系统可以测量一个或多个旋转角度下样品的穆勒矩阵,扩散取向或延迟,以计算各向异性量值和取向。

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