公开(公告)号：EP4332277A1

公开(公告)日：2024-03-06

申请号：EP22192691.8

申请日：2022-08-29

申请人： Atotech Deutschland GmbH & Co. KG

发明人： Schirmer, Christian ,  Schafsteller, Britta ,  Weinhold, Ray ,  Kiehl, Markus ,  Jang, Don ,  Lorenz, Olaf ,  Gaul, Florian

IPC分类号： C25D17/06 ,  C23G3/02 ,  H01L21/687 ,  B08B3/04 ,  B05C5/00

摘要： A device for holding a planar substrate (1) in an apparatus for non-immersive wet-chemical treatment of the substrate (1) comprises a support structure (34). The support structure (34) comprises at least one part (36a,b) for engaging a support such as to suspend the support structure (34) in the apparatus. The device comprises at least one clamping device, supported by the support structure (34), for holding the substrate (1) in a plane; and at least a first upper flow guidance part (37), arranged on one side of the plane and having an inward-facing surface (44) facing inwards and an outward-facing surface facing outwards with respect to the plane. The outward-facing surface comprises an upper outward-facing surface section (46), wettable by a stream of liquid directed onto the upper outward-facing surface section (46), and a lower outward-facing surface section (47), extending from a transition between at least a central part of the upper outward-facing surface section (46) and the lower outward-facing surface section (47) to a lower edge (49). A strip (45) of the inward-facing surface extends longitudinally along the lower edge (49) and transversely up to the lower edge (49). At least a central longitudinal section of the strip (45) is movable into engagement with a major surface of the substrate (1) over an entire length of that section.