THIN FILM TRANSISTOR AND MANUFACTURING METHOD THEREOF, ARRAY SUBSTRATE AND DISPLAY APPARATUS

    公开(公告)号:EP3208851A4

    公开(公告)日:2018-06-13

    申请号:EP15762463

    申请日:2015-03-16

    Abstract: The present invention discloses a thin-film transistor and a fabricating method thereof, an array substrate and a display apparatus. An active layer in the thin-film transistor comprises a first active layer and a second active layer which are stacked; wherein, an orthographic projection of the first active layer on the substrate covers orthographic projections of the source electrode, the drain electrode as well as a gap located between the source electrode and the drain electrode on the substrate, and covers an orthographic projection of the gate electrode on the substrate; the second active layer is located at the gap between the source electrode and the drain electrode, and an orthographic projection of the second active layer on the substrate is located in a region where the orthographic projection of the gate electrode on the substrate is located. Under a backlight illumination condition, because the region where the second active layer of the thin-film transistor is located is shielded by the gate electrode, only a region, which is not shielded by the gate electrode, in the first active layer may generate photo-induced carriers. Consequently, there are less photo-induced carriers generated by such a structure, the increase of an off-state current is effectively inhibited, and thus an on-state current to off-state current ratio is increased, leading to an improved luminescence property of the thin-film transistor, and an enhanced image display quality of a display device.

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