专利检索 ap:("Cabot Microelectronics Corporation") AND inv:"Hoglund, Eric W.G." 第 1 页

1.

发明授权
A polishing composition including an inhibitor of tungsten etching 失效
标题翻译：磨料组合物，其包括用于钨的蚀刻的抑制剂

公开(公告)号：EP0896042B1

公开(公告)日：2005-02-09

申请号：EP98305999.9

申请日：1998-07-28

申请人： Cabot Microelectronics Corporation

发明人： Grumbine, Steven K. , Streinz, Christopher C. , Hoglund, Eric W.G.

IPC分类号： C09G1/02 , H01L21/321 , C09K3/14 , C23F3/00 , C23F3/04 , C23F3/06

CPC分类号： C23F3/00 , C09G1/02 , C09K3/1463 , H01L21/3212

摘要： A chemical mechanical polishing composition and slurry comprising a composition capable of etching tungsten and at least one inhibitor of tungsten etching and methods for using the composition and slurry to polish tungsten containing substrates.