Optical encoder and displacement measurement apparatus
    2.
    发明公开
    Optical encoder and displacement measurement apparatus 审中-公开
    光学编码器和位移测量装置

    公开(公告)号:EP2365292A3

    公开(公告)日:2013-11-13

    申请号:EP11157480.2

    申请日:2011-03-09

    发明人: Ishizuka, Ko

    IPC分类号: G01D5/38

    CPC分类号: G01D5/38

    摘要: An optical encoder (10, 20, 30) includes a light-emitting element (LED), a scale grating (SCL) configured to transmit or reflect a divergent light from the light-emitting element to divide the divergent light into a plurality of lights, an optical mask grating (SLT) configured to modulate the plurality of lights with phases thereof different from each other in accordance with a relative movement between the light-emitting element and the scale grating, and a light-receiving element array (PDA) including a plurality of light-receiving elements configured to receive the modulated plurality of lights.

    Origin detection apparatus, displacement measurement apparatus and optical apparatus
    3.
    发明公开
    Origin detection apparatus, displacement measurement apparatus and optical apparatus 有权
    原点检测装置,位移测量装置和光学装置

    公开(公告)号:EP2219012A3

    公开(公告)日:2012-10-31

    申请号:EP10153000.4

    申请日:2010-02-09

    发明人: Ishizuka, Ko

    IPC分类号: G01D5/38 G01D5/245

    CPC分类号: G01D5/38 G01D5/2457

    摘要: An apparatus includes a light source (LD), a scale (SC) which is configured to have first and second diffraction grating portions (GT1 and GT2) which differ from each other in a grating pitch, a light receiving portion (PD) configured to receive first and second interference light fluxes generated from interference of a plurality of diffraction light fluxes, at the first and second diffraction grating portions, respectively, a light flux emitted from the light source and have different orders of diffraction, and to output first and second periodic signals based on an intensity of the first and second interference light fluxes, respectively, and computing means (LO) configured to output, based on the first and second periodic signals (U1, V1, and W1, and U2, V2, and W2) a signal representing an origin of displacement of the scale.

    Wavelength shift measuring apparatus, optical source apparatus, interference measuring apparatus, exposure apparatus, and device manufacturing method
    4.
    发明公开
    Wavelength shift measuring apparatus, optical source apparatus, interference measuring apparatus, exposure apparatus, and device manufacturing method 审中-公开
    Wellenlängenverschiebungsmessvorrichtung,optische Quellenvorrichtung,Störungsmessvorrichtung,Belichtungsvorrichtung und Vorrichtungsherstellungsverfahren

    公开(公告)号:EP2180301A2

    公开(公告)日:2010-04-28

    申请号:EP09173968.0

    申请日:2009-10-23

    发明人: Ishizuka, Ko

    IPC分类号: G01J9/02

    摘要: A wavelength shift measuring apparatus of the present invention is a wavelength shift detector (WLCD1) which measures a shift of a wavelength of a light beam emitted from a light source, and includes a beam splitter (BS2) splitting the light beam emitted from the light source into a plurality of light beams and to synthesize two light beams among the plurality of light beams to generate an interference light, a spacer member (SP) provided so that an optical path length difference of the two light beams split by the beam splitter (PBS2) is constant, and a plurality of photoelectric sensors (PD) detecting the interference light generated by the beam splitter (BS2). The plurality of photoelectric sensors (PD) output a plurality of interference signals having phases shifted from one another based on the interference light to measure a wavelength shift using the plurality of interference signals.

    摘要翻译: 本发明的波长偏移测量装置是测量从光源发射的光束的波长偏移的波长偏移检测器(WLCD1),并且包括分离从光发射的光束的分束器(BS2) 源多个光束并且在多个光束中合成两个光束以产生干涉光;隔离部件(SP),其被设置成使得由分束器分离的两个光束的光程长度差 PBS2)和多个光电传感器(PD),用于检测由分束器(BS2)产生的干涉光。 多个光电传感器(PD)基于干涉光输出具有彼此相移的多个干涉信号,以使用多个干涉信号测量波长偏移。

    Displacement measurement apparatus
    5.
    发明公开
    Displacement measurement apparatus 审中-公开
    Verschiebungsmessvorrichtung

    公开(公告)号:EP2169358A2

    公开(公告)日:2010-03-31

    申请号:EP09170356.1

    申请日:2009-09-15

    发明人: Ishizuka, Ko

    IPC分类号: G01D5/38

    CPC分类号: G01D5/38

    摘要: A displacement measurement apparatus includes a first diffraction grating (GBS0) transmitting light from a light source and producing diffracted beams including first to third diffracted beams output in different directions. The apparatus further includes a second diffraction grating (GT0) movable together with an object to be measured, provided in a plane parallel to the first diffraction grating (GBSO) and reflecting the first to third diffracted beams transmitted through the first diffraction grating (GBSO). The apparatus also includes a first photodetector (PDy) receiving the first and second diffracted beams diffracted by the second diffraction grating(GTO); a second photodetector (PDz) receiving at least the third diffracted beam transmitted through the first diffraction grating (GBSO). Finally the apparatus includes a calculation unit (CU) calculating displacement of the object in a first direction in accordance with the beams received by the first photodetector (PDy), and displacement of the object in a second direction, different from the first direction, in accordance with the beam received by the second photodetector (PDz).

    摘要翻译: 位移测量装置包括从光源透射光并产生包括沿不同方向输出的第一至第三衍射光束的衍射光束的第一衍射光栅(GBS0)。 该装置还包括与平行于第一衍射光栅(GBSO)的平面设置并且反射透射通过第一衍射光栅(GBSO)的第一至第三衍射光束的可与被测物体一起移动的第二衍射光栅(GT0) 。 该装置还包括接收由第二衍射光栅(GTO)衍射的第一和第二衍射光束的第一光电检测器(PDy); 接收至少透过第一衍射光栅(GBSO)的第三衍射光束的第二光电检测器(PDz)。 最后,该装置包括:计算单元(CU),根据由第一光电检测器(PDy)接收的光束计算物体在第一方向上的位移,以及物体沿与第一方向不同的第二方向的位移, 根据由第二光电检测器(PDz)接收的光束。

    Scale and manufacturing method thereof, and absolute encoder
    9.
    发明公开
    Scale and manufacturing method thereof, and absolute encoder 有权
    Skala und Herstellungsverfahrendafürund Absolutkodierer

    公开(公告)号:EP2551646A2

    公开(公告)日:2013-01-30

    申请号:EP12176064.9

    申请日:2012-07-12

    发明人: Ishizuka, Ko

    IPC分类号: G01D5/347

    CPC分类号: G01D5/34707

    摘要: A scale (SCL) of an absolute encoder, on which a plurality of marks are arranged at predetermined pitches along at least one direction, includes: a base (Ba, Bb, G) including a plurality of light-reflective or light-transmissive marks (RGP) arranged at the predetermined pitches along the at least one direction. A film (HTL, HT), which attenuates light, is formed on each of marks (HTP) as a part of the plurality of marks.

    摘要翻译: 绝对编码器的刻度(SCL),其上沿着至少一个方向以预定的间距布置多个标记,包括:基底(Ba,Bb,G),包括多个光反射或透光标记 (RGP)沿所述至少一个方向以预定间距布置。 作为多个标记的一部分,在每个标记(HTP)上形成有衰减光的膜(HTL,HT)。