专利检索 ap:("Cardinal CG Company" OR "General Plasma, Inc.") AND inv:"SMITH, Steve, E." 第 1 页

1.

发明公开
CYLINDRICAL TARGET WITH OSCILLATING MAGNET FROM MAGNETRON SPUTTERING 审中-公开
标题翻译：摆动磁铁磁控圆柱记录部

公开(公告)号：EP1774563A1

公开(公告)日：2007-04-18

申请号：EP05763473.5

申请日：2005-06-30

申请人： Cardinal CG Company , General Plasma, Inc.

发明人： HARTIG, Klaus , SMITH, Steve, E. , MADOCKS, John, E.

IPC分类号： H01J37/34

CPC分类号： H01J37/3455 , H01J37/3405 , H01J37/3423 , H01J37/3497

摘要： In some embodiments, the invention includes a cylindrical cathode target assembly for use in sputtering target material onto a substrate that comprises a generally cylindrical target, mean for rotating the target about its axis during a sputtering operation, an elongated magnet carried within the target for generation of a plasma-containing magnetic field exterior to but adjacent the target, a framework for supporting the magnet against rotation within the target, and a power train for causing the magnet to oscillate within and axially of the target in a substantially asynchronous manner to promote generally uniform target utilization along its length, as well as its method of use. In some embodiments, the magnet is oscillated in response to rotation of the target.