公开(公告)号：EP1777728A1

公开(公告)日：2007-04-25

申请号：EP05022915.2

申请日：2005-10-20

申请人： Carl Zeiss SMS GmbH

发明人： Buschbeck, Herbert, Dipl.-Ing. ,  Platzgummer, Elmar, Dr. Dipl.-Ing. ,  Stengl, Gerhard, Dr. Dipl.-Ing. ,  Vonach, Herbert, Dr. Prof.

IPC分类号： H01J37/147 ,  H01J37/317 ,  H01J37/21

CPC分类号： H01J37/3174 ,  B82Y10/00 ,  B82Y40/00 ,  H01J37/147 ,  H01J37/21 ,  H01J2237/0492 ,  H01J2237/24578

摘要： A charged particle lithography system comprises a particle source for generating a beam of charged particles, a pattern defining structure and a particle-optical projection system for imaging the pattern defined by the pattern defining structure onto a substrate. The particle-optical projection system comprises a focusing first magnetic lens (403) comprising an outer pole piece (411) having a radial inner end (411'), and an inner pole piece (412) having a lowermost end (412') disposed closest to the radial inner end of the outer pole piece, a gap being formed those; a focusing electrostatic lens (450) having at least a first electrode (451) and a second electrode (452) disposed in a region of the gap; and a controller (C) configured to control a focusing power of the first electrostatic lens based on a signal indicative of a distance of a surface of the substrate from a portion of the first magnetic lens disposed closest to the substrate.