公开(公告)号：EP1015931B1

公开(公告)日：2006-03-29

申请号：EP99929277.4

申请日：1999-06-18

申请人： Carl Zeiss SMT AG

发明人： GABER, Erwin ,  WAGNER, Christian ,  HOLDERER, Hubert ,  GERHARD, Michael ,  MERZ, Erich ,  BECKER, Jochen ,  SCHEIBERLICH, Arie, Cormelis

IPC分类号： G02B7/02 ,  G02B26/06 ,  G03F7/20

CPC分类号： G03F7/70825 ,  G02B7/023 ,  G02B7/028 ,  G02B27/0068 ,  G03F7/70241 ,  G03F7/70358 ,  G03F7/70783

摘要： The invention relates to an optical system, especially a projection light facility for microlithography, especially with an image field shaped as a slit or with non rotational symmetry illumination, comprising an optical element (1), especially a lens or a mirror, which is arranged in a mount (2) and actuators (3) which engage with the optical element (1) at least nearly perpendicular to the optical axis. The actuators (3) effect non rotational symmetric forces and/or moments deviating from the radial lines in the optical element (1) to generate deformations with substantially no changes in thickness. Image errors arising as a result of asymmetric heating of the optical system are compensated for by deformation of the optical element.