公开(公告)号：EP2188673A1

公开(公告)日：2010-05-26

申请号：EP08784878.4

申请日：2008-07-18

申请人： Carl Zeiss SMT AG

发明人： LÖRING, Ulrich ,  REISINGER, Gerd ,  STICKEL, Franz-Josef ,  SCHNEIDER, Sonja ,  TRENKLER, Johann ,  KRAUS, Stefan ,  DÖRING, Gordon ,  GÖHNERMEIER, Aksel

IPC分类号： G03F7/20 ,  G03F1/14

CPC分类号： G03F7/70983 ,  G03F1/62 ,  G03F7/70308 ,  Y10T428/24612

摘要： A projection objective comprising a plurality of optical elements arranged to image a pattern from an object field in an object surface of the projection objective to an image field in an image surface of the projection objective with electromagnetic operating radiation from a wavelength band around an operating wavelength λ includes an optical correction plate. The optical correction plate has a body made from a material transparent to the operating radiation, the body having a first optical surface, a second optical surface, a plate normal substantially perpendicular to the first and second optical surface, and a thickness profile. The first surface profile and the second surface profile are similar in that the first optical surface has a non-rotationally symmetric aspheric first surface profile with a first peak-to-valley value PV1>λ; the second optical surface has a non-rotationally symmetric aspheric second surface profile with a second peak-to-valley value PV2>λ; and the plate thickness varies by less than 0.1 * (PV1+PV2V2 across the optica! correction piate. The first and second optical surface in combination may induce or correct for a dominant field aberration if the optical correction plate is installed at a position far from the object plane of the projection objective.