PROCESSES FOR PREPARING CYCLIC COMPOUNDS
    1.
    发明公开
    PROCESSES FOR PREPARING CYCLIC COMPOUNDS 失效
    VERFAHREN ZUR HERSTELLUNG VON ZYKLISCHEN VERBINDUNGEN

    公开(公告)号:EP0829473A4

    公开(公告)日:1998-10-07

    申请号:EP96914415

    申请日:1996-05-23

    摘要: Compounds of general formula (I), wherein n is an integer of 2 to 5; R1 is H or a substituent of general formula (R1) (wherein R?a, Rb and Rc¿ are each phenyl, phenylmethyl or naphthyl optionally substituted with one or more substituents of at least one member selected from the group consisting of C¿1?-C4 alkyl, C1-C4 alkoxy, halogeno and nitro, H or C1-C4 alkyl); and R?2¿ is H or C¿1?-C4 alkyl (with the proviso that the compound wherein n is 2, R?1¿ is H and R2 is ethyl is excepted); other compounds of general formula (II) prepared from the compounds of general formula (I), being useful as an antimicrobial; and novel processes for preparing these compounds at a low cost and in less steps.

    摘要翻译: 通式(I)的化合物,其中n是2至5的整数; R 1是H或通式(R 1)的取代基(其中R 3a,R b和R c各自是苯基,苯基甲基或萘基,其任选被一个或多个选自C 1 C 1 -C 4烷基,C 1 -C 4烷氧基,卤代和硝基,H或C 1 -C 4烷基); R 2'是H或C 1 -C 4烷基(条件是其中n是2,R 1'是H并且R 2是乙基的化合物是例外)。 由通式(I)化合物制备的通式(II)的其它化合物可用作抗微生物剂; 以及以较低成本和较少步骤制备这些化合物的新方法。

    ENANTIOMERICALLY PURE SUBSTITUTED OXAAZA COMPOUNDS, SALTS OF THE SAME, AND PROCESSES FOR THE PREPARATION OF BOTH
    2.
    发明公开
    ENANTIOMERICALLY PURE SUBSTITUTED OXAAZA COMPOUNDS, SALTS OF THE SAME, AND PROCESSES FOR THE PREPARATION OF BOTH 有权
    对映异构的取代的OXAAZAVERBINDUNGEN及其盐和方法同时产生

    公开(公告)号:EP1088825A4

    公开(公告)日:2001-09-05

    申请号:EP99957061

    申请日:1999-06-16

    CPC分类号: C07D207/14

    摘要: A process for easily preparing compounds represented by general formula (Ia) which are useful as intermediates for the preparation of antimicrobial compounds, comprising reacting a compound represented by general formula (I) with a ketone and an optically active acid to form a salt of a compound represented by general formula (IIIa) with the optically active acid, converting the salt into a free base and hydrolyzing the free base wherein R1 is hydrogen, alkyl, aryl or aralkyl; and R2 is hydrogen, alkyl, aryl, aralkyl, acyl, alkyloxycarbonyl, aralkyloxycarbonyl or substituted sulfonyl, provided these groups may be further substituted.