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    Photocomposing method and system therefor
    3.
    发明公开
    Photocomposing method and system therefor 失效
    Photosatzverfahren und系统。

    公开(公告)号：EP0441254A2

    公开(公告)日：1991-08-14

    申请号：EP91101347.2

    申请日：1991-02-01

    申请人： Dainippon Screen Mfg. Co., Ltd.

    发明人： Murayama, Minoru, c/o Dainippon Screen Mfg. Co Ltd ,  Ito, Kazuhiko, c/o Dainippon Screen Mfg. Co., Ltd. ,  Hashimoto, Takeharu, Dainippon Screen Mfg. Co. Ltd ,  Tokuda, Masayuki, c/o Dainippon Screen Mfg. Co Ltd

    IPC分类号： B41B19/00 ,  G03F1/04 ,  G03F9/00

    CPC分类号： B41B19/00

    摘要： Plural images and plural register marks are printed on a photosensitive material with an original plate including an original image and register marks. Two kinds of masks are prepared before the printing: a photocomposing mask for masking the original image and the register marks on the original plate, and an exposing-out mask for masking the images and the register marks on the photosensitive material. First, the plural images and the register marks are printed on the photosensitive material while overlaying the original plate with the photocomposing mask by a photocomposer. Secondly, the photosensitive material is exposed with the exposing-out mask overlaid. Even if the plural images are nested to each other, the total procedure can be performed easily while using the two masks. The two masks can be fabricated easily on the basis of the shape of the original image and of the positions and orientations of the plural images on the photosensitive material.

    摘要翻译： 多张图像和多个对准标记印在感光材料上，原稿包括原始图像和对准标记。 在打印之前准备两种掩模：用于掩蔽原始图像和原版上的对准标记的光电掩模，以及用于掩蔽感光材料上的图像和对准标记的曝光掩模。 首先，将多个图像和对准标记印刷在感光材料上，同时用光电投影仪将原版与光电面罩重叠。 其次，曝光掩模曝光感光材料。 即使多个图像彼此嵌套，可以在使用两个掩码的同时执行总程序。 可以基于原始图像的形状和感光材料上的多个图像的位置和取向容易地制造两个掩模。