METHOD OF FORMING A NANOPOROUS DIELECTRIC FILM
    1.
    发明授权
    METHOD OF FORMING A NANOPOROUS DIELECTRIC FILM 有权
    VERFAHREN ZUR HERSTELLUNG EINESNANOPORÖSENDIELEKTRISCHEN FILMS

    公开(公告)号:EP1758953B1

    公开(公告)日:2011-09-28

    申请号:EP04754861.5

    申请日:2004-06-10

    IPC分类号: C08J9/26 C08L65/00

    摘要: A method comprising forming a coating solution which comprises a matrix precursor material, a porogen material and a solvent, by selecting a polyarylene matrix precursor material which cross-links to form a matrix with a calculated cross-link moeity density of at least 0.003 moles/ml, and reacting the polyarylene matrix precursor material with a porogen which is linear oligomer or polymer which is formed from monomers comprising alkenyl or alkynyl functional monomers, which has reactive end groups and a weight average molecular weight in the range of less than about 5000, where the porogen is present in amounts in the range of about 10 to less than 50 percent by weight based on total weight of porogens and matrix precursor material.

    摘要翻译: 一种方法,包括通过选择交联以形成基质的聚亚芳基基质前体材料形成包含基体前体材料,致孔剂材料和溶剂的涂布溶液,所计算的交联摩尔密度为至少0.003摩尔/ 并且使聚亚芳基基质前体材料与作为线性低聚物或聚合物的致孔剂反应,所述致孔剂由具有反应性端基和重均分子量在小于约5000的范围内的包含链烯基或炔基官能单体的单体形成, 其中致孔剂以基于致孔剂和基质前体材料的总重量计约10至小于50重量%的量存在。