公开(公告)号：EP2593577A2

公开(公告)日：2013-05-22

申请号：EP11748597.9

申请日：2011-07-12

申请人： Dreistegen GmbH ,  Hoedtke GmbH & Co. KG

发明人： KAYSER, Oliver

IPC分类号： C23C14/32 ,  C25B11/04

CPC分类号： C23C14/325 ,  C23C14/0021 ,  C25B11/00 ,  H01J37/32055 ,  H01J37/3244 ,  H01J37/32568 ,  H01J37/32614 ,  H01J2237/332

摘要： The invention relates to a process and an evaporator (12, 14, 62, 64, 66, 68) for coating a substrate by means of an arc in a vacuum chamber (10) in the case of low-pressure arc evaporation, wherein the vacuum chamber (10) has at least one evaporator (12, 14, 62, 64, 66, 68), which comprises a target material (20), reactive gas supply lines (53, 54) for supplying reactive gas, and a vacuum pump, wherein the evaporator (12, 14, 62, 64, 66, 68) comprising the target material (20) serves as the cathode and the inner wall (36) of the vacuum chamber (10) serves as the anode between which the arc is generated. According to the invention, high-melting metal is used as the target material (20) for catalysis, and the pressure in the vacuum chamber (20) during coating is at least 0.5 Pa, in particular at least 3 Pa, preferably 5 Pa. A layer of catalytically active metal having a high oxygen content is formed on the substrate.