Vapor deposition method and apparatus
    2.
    发明公开
    Vapor deposition method and apparatus 失效
    Verfahren zur Abscheidung aus der Dampfphase und Vorrichtung

    公开(公告)号:EP0813108A1

    公开(公告)日:1997-12-17

    申请号:EP97108795.2

    申请日:1997-06-02

    IPC分类号: G03C1/74 G03D5/00

    CPC分类号: G03C1/74

    摘要: A vapor deposition method and apparatus that performs the method. In the method, a supply of vaporizable material is maintained, in a first zone, in thermal and phase equilibrium with a saturated vapor at a first temperature. A volume of the vapor is withdrawn to a second zone. The temperature of the volume of vapor in the second zone is adjusted to a second temperature in excess of the first temperature. The volume of vapor is delivered to a third zone. A substrate is transported through the third zone. The substrate has a third temperature below the first temperature. During the transporting, a portion of the volume of vapor is condensed onto the substrate to provide a condensate. During the condensing, the temperature of the substrate is raised to substantially the first temperarature.

    摘要翻译: 一种执行该方法的气相沉积方法和装置。 在该方法中,在第一区域中,在第一温度下,与饱和蒸汽的热和相平衡,可蒸发材料的供应被保持。 蒸汽的体积被抽出到第二区域。 将第二区域中的蒸汽体积的温度调节到超过第一温度的第二温度。 蒸汽的体积被输送到第三区域。 衬底被输送通过第三区。 衬底具有低于第一温度的第三温度。 在输送过程中,一部分蒸气被冷凝到基底上以提供冷凝物。 在冷凝期间,将基板的温度升高到基本上第一个温度。

    Water deposition apparatus and method
    3.
    发明公开
    Water deposition apparatus and method 失效
    Vorrichtung zum Aufbringen von Wasser und Verfahren

    公开(公告)号:EP0813106A1

    公开(公告)日:1997-12-17

    申请号:EP97108749.9

    申请日:1997-06-02

    IPC分类号: G03C1/74 G03D5/00

    摘要: Apparatus and method for depositing water onto the surface of a substrate passed through the apparatus. The apparatus has a housing that defines an internal atmosphere confined in at least partial isolation from the ambient atmosphere. The housing has a moisture saturation portion (12), a deposition portion (36), and a passageway (16). The moisture saturation portion has a water supply (10) and a vapor reservoir. The water supply contains a quantity of water. The vapor reservoir holds a volume of the interior atmosphere in thermal and phase equilibrium with the water in the water supply. The deposition portion has a plenum wall (86) surrounding a central chamber. The plenum wall is substantially insulated from ambient temperature variations and has a pair of opposed substrate gaps (82). The gaps define a path (84) for the substrate through the chamber. The passageway (16) communicates with the vapor reservoir and the chamber. A primary heater (56) is disposed to heat the water in the water supply. A secondary heater (68) is disposed within the passageway between the vapor reservoir and the chamber. A fan (66) drives the internal atmosphere from the vapor reservoir through the passageway to the chamber. A controller (92) is operatively connected to the primary and secondary heaters. The controller senses wet and dry bulb temperatures of the internal atmosphere in the chamber. The controller actuates the primary heater at a range of wet bulb temperatures below a predetermined wet bulb limit temperature and actuates the secondary heater at a range of dry bulb temperatures below a predetermined dry bulb limit temperature. The dry bulb limit temperature is greater than the wet bulb limit temperature.

    摘要翻译: 用于将水沉积到穿过该装置的基板的表面上的装置和方法。 该装置具有壳体,该壳体限定与至少部分隔离环境大气隔离的内部气氛。 壳体具有湿气饱和部分(12),沉积部分(36)和通道(16)。 水分饱和部分具有供水(10)和蒸气储存器。 供水包含一定量的水。 蒸汽储存器保持与供水中的水的热和相平衡的内部空气的体积。 沉积部分具有围绕中心室的增压壁(86)。 气室壁基本上与环境温度变化绝缘,并具有一对相对的衬底间隙(82)。 间隙限定了通过腔室的衬底的路径(84)。 通道(16)与蒸气储存器和腔室连通。 第一加热器(56)设置成加热供水中的水。 二次加热器(68)设置在蒸气储存器和腔室之间的通道内。 风扇(66)通过通道将气体从蒸汽储存器驱动到室。 控制器(92)可操作地连接到主加热器和辅助加热器。 控制器感测室内内部气氛的湿和干球温度。 控制器在低于预定湿球限制温度的湿球温度的范围内致动主加热器,并且在低于预定干球限制温度的干球温度的范围内致动二次加热器。 干球限制温度大于湿球限温。