公开(公告)号：EP0508748A2

公开(公告)日：1992-10-14

申请号：EP92303111.6

申请日：1992-04-08

申请人： EATON CORPORATION

发明人： Bellamy, Brad Lee

IPC分类号： H01L21/00

CPC分类号： H01L21/68 ,  H01L21/67796

摘要： A system for positioning a wafer (12) at a station within a wafer processing system such that the center of mass of the wafer coincides with the center of the rotatable chuck (22) at the station. A signal representative of the position of the wafer with respect to the rotatable chuck is produced by a sensor (54) and is utilized to determine a vector which defines distance and direction of the centering error between the center of rotation of the chuck and the center of mass of the wafer. The chuck and wafer are rotationally indexed through an angle to align the foregoing vector with a line which approximates the arcuate path traversed by the center of mass of the wafer when it is subsequently conveyed within the system. A transfer arm (44) is utilized to convey the wafer through the foregoing arcuate path with respect to the chuck so that the center of mass of the wafer coincides with the center of rotation of the chuck when the wafer is subsequently placed on same.

摘要翻译： 一种用于在晶片处理系统内的站处定位晶片（12）的系统，使得晶片的质心与工位的可旋转卡盘（22）的中心重合。 表示晶片相对于可旋转卡盘的位置的信号由传感器（54）产生，并且用于确定限定卡盘的旋转中心与中心的定心误差的距离和方向的矢量 的晶片质量。 卡盘和晶片被旋转成一定角度，以将前述矢量与接近在晶片质量随之在系统内传送的晶圆通过的弧形路径相对准。 转移臂（44）用于通过相对于卡盘的上述弧形路径传送晶片，使得当晶片随后放置在其上时，晶片的质心与卡盘的旋转中心重合。

公开(公告)号：EP0120576A3

公开(公告)日：1986-08-20

申请号：EP84300913

申请日：1984-02-14

申请人： EATON CORPORATION

发明人： Dykstra, Jerald Paul ,  Bellamy, Brad Lee

IPC分类号： H01J49/30 ,  H01J37/317

CPC分类号： H01J37/3171 ,  H01J49/02

摘要： An apparatus and method for measuring the atomic mass of ion species selected by the analyzing magnet (14) of an ion implanter (10). A signal proportional to the magnetic field of the analyzing magnet is obtained by means of a rotating coil (36), and this signal is used to calculate the atomic mass by means of the equation: Atomic Mass = KB 2 /V where B is the magnetic field, V is the ion beam energy at the analyzing magnet, and K is a proportionality constant. The rotating coil (36) is driven by a synchronous motor (38) powered by A.C. line voltage, and the output voltage is converted to a frequency signal proportional to the magnetic field and the line frequency. The frequency signal is counted over a time corresponding to the period of the line frequency to cancel out the line frequency dependence of the frequency signal. In accordance with one embodiment of the invention, a microprocessor is utilized to evaluate the B and V signals and to calculate the atomic mass.

公开(公告)号：EP0508748A3

公开(公告)日：1993-02-03

申请号：EP92303111.6

申请日：1992-04-08

申请人： EATON CORPORATION

发明人： Bellamy, Brad Lee

IPC分类号： H01L21/00

CPC分类号： H01L21/68 ,  H01L21/67796

摘要： A system for positioning a wafer (12) at a station within a wafer processing system such that the center of mass of the wafer coincides with the center of the rotatable chuck (22) at the station. A signal representative of the position of the wafer with respect to the rotatable chuck is produced by a sensor (54) and is utilized to determine a vector which defines distance and direction of the centering error between the center of rotation of the chuck and the center of mass of the wafer. The chuck and wafer are rotationally indexed through an angle to align the foregoing vector with a line which approximates the arcuate path traversed by the center of mass of the wafer when it is subsequently conveyed within the system. A transfer arm (44) is utilized to convey the wafer through the foregoing arcuate path with respect to the chuck so that the center of mass of the wafer coincides with the center of rotation of the chuck when the wafer is subsequently placed on same.

摘要翻译： 一种用于在晶片处理系统内的站处定位晶片（12）的系统，使得晶片的质心与工位的可旋转卡盘（22）的中心重合。 表示晶片相对于可旋转卡盘的位置的信号由传感器（54）产生，并且用于确定限定卡盘的旋转中心与中心的定心误差的距离和方向的矢量 的晶片质量。 卡盘和晶片被旋转成一定角度，以将前述矢量与接近在晶片质量随之在系统内传送的晶圆通过的弧形路径相对准。 转移臂（44）用于通过相对于卡盘的上述弧形路径传送晶片，使得当晶片随后放置在其上时，晶片的质心与卡盘的旋转中心重合。

公开(公告)号：EP0120576A2

公开(公告)日：1984-10-03

申请号：EP84300913.5

申请日：1984-02-14

申请人： EATON CORPORATION

发明人： Dykstra, Jerald Paul ,  Bellamy, Brad Lee

IPC分类号： H01J49/30 ,  H01J37/317

CPC分类号： H01J37/3171 ,  H01J49/02

摘要： An apparatus and method for measuring the atomic mass of ion species selected by the analyzing magnet (14) of an ion implanter (10). A signal proportional to the magnetic field of the analyzing magnet is obtained by means of a rotating coil (36), and this signal is used to calculate the atomic mass by means of the equation: Atomic Mass = KB 2 /V where B is the magnetic field, V is the ion beam energy at the analyzing magnet, and K is a proportionality constant. The rotating coil (36) is driven by a synchronous motor (38) powered by A.C. line voltage, and the output voltage is converted to a frequency signal proportional to the magnetic field and the line frequency. The frequency signal is counted over a time corresponding to the period of the line frequency to cancel out the line frequency dependence of the frequency signal. In accordance with one embodiment of the invention, a microprocessor is utilized to evaluate the B and V signals and to calculate the atomic mass.