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1.发明授权PROCÉDÉ DE PRÉPARATION À BASSE TEMPÉRATURE DE REVÊTEMENTS MÉSOSTRUCTURÉS ÉLECTROCONDUCTEURS 有权一种用于生产中间结构的导电性涂层低的温度
公开(公告)号：EP2580373B1
公开(公告)日：2015-07-08
申请号：EP11726908.4
申请日：2011-05-26
申请人： Essilor International (Compagnie Générale d'Optique) , Centre National de la Recherche Scientifique (CNRS)
发明人： BIVER, Claudine , DULUARD, Sandrine , CORDE, Joëlle , BOILOT, Jean-Pierre , GACOIN, Thierry , PERRUCHAS, Sandrine
CPC分类号： B05D3/065 , C23C18/1225 , C23C18/1254 , C23C18/1295 , C23C18/14 , C23C18/1603 , C23C18/165 , C23C18/1667 , C23C18/42 , Y10T428/265
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2.发明公开PROCEDE DE PREPARATION A BASSE TEMPERATURE DE REVETEMENTS MESOSTRUCTURES ELECTROCONDUCTEURS 有权一种用于生产中间结构的导电性涂层低的温度
公开(公告)号：EP2580373A1
公开(公告)日：2013-04-17
申请号：EP11726908.4
申请日：2011-05-26
申请人： Essilor International (Compagnie Générale d'Optique) , Centre National de la Recherche Scientifique CNRS
发明人： BIVER, Claudine , DULUARD, Sandrine , CORDE, Joëlle , BOILOT, Jean-Pierre , GACOIN, Thierry , PERRUCHAS, Sandrine
CPC分类号： B05D3/065 , C23C18/1225 , C23C18/1254 , C23C18/1295 , C23C18/14 , C23C18/1603 , C23C18/165 , C23C18/1667 , C23C18/42 , Y10T428/265
摘要： The present invention relates to a method for manufacturing mesostructured coatings comprising electrically conductive structures formed of metal nanoparticles. Said method includes the steps that involve: a) depositing, on a substrate, a first layer consisting of a silica material, mesostructured by a structuring agent, and a photocatalytic material; b) depositing, on the first layer, a second layer of a mesostructured silica material, said second layer being free of photocatalytic material; c) consolidating the first and second layers at a temperature between 50º C and 250º C; and d) placing the consolidated coating in contact with a solution that contains metal ions and irradiating said coating with a radiation that enables the photocatalytic material to be activated. Said method is characterized in that it includes no heat treatment at a temperature greater than 250º C.
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