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    PRODUCTION LINE MONITORING DEVICE
    1.
    发明公开
    PRODUCTION LINE MONITORING DEVICE 审中-公开
    ÜBERWACHUNGSVORRICHTUNGFÜRFERTIGUNGSSTRASSE

    公开(公告)号：EP2902861A4

    公开(公告)日：2016-07-13

    申请号：EP12885868

    申请日：2012-09-28

    申请人： FUJI MACHINE MFG

    发明人： NAKAYAMA DAISUKE

    IPC分类号： G05B19/418 ,  G07C3/14 ,  H05K13/00 ,  H05K13/08

    CPC分类号： G07C3/146 ,  G05B19/41875 ,  G05B2219/32222 ,  H05K13/08 ,  Y02P90/22

    摘要： There is provided a production line monitoring device that can identify a cause of a production defect with a high accuracy, reduce the amount of analysis data and the amount of computation, and perform real-time processing. A production line monitoring device 6 of the invention includes a defect indication detection unit 61 that detects an indication of a production defect of a production line 1, and a defect cause identification unit 62 that identifies a cause of the production defect. The defect indication detection unit 61 collects measurement information that is measured by an inspection apparatus 5 for each of references REF1 to REF3 that identifies a position on products, and detects an indication of the production defect from the change with time of the measurement information at the references REF1 to REF3. The defect cause identification unit 62 performs stratified analysis on the basis of production information that is related to the reference REF2 when the defect indication detection unit 61 detects an indication of a production defect, and identifies a cause of a production defect from a result of the analysis.

    摘要翻译： 提供了能够高精度地识别生产缺陷的原因的生产线监视装置，减少分析数据量和计算量，并进行实时处理。 本发明的生产线监视装置6包括检测生产线1的生产缺陷的指示的缺陷指示检测单元61和识别生产缺陷的原因的缺陷原因识别单元62。 缺陷指示检测单元61收集由检查装置5对于识别产品上的位置的参考信号REF1至REF3测量的测量信息，并且根据测量信息随时间的变化检测生产缺陷的指示 将REF1引用到REF3。 当缺陷指示检测单元61检测到生产缺陷的指示时，缺陷原因识别单元62基于与参考值REF2相关的生产信息进行分层分析，并从生成缺陷的结果中识别生产缺陷的原因 分析。