Method for the development of photoresist layers, and developer
    2.
    发明公开
    Method for the development of photoresist layers, and developer 失效
    Methode zum Entwickeln von Photoresistschichten und Entwickler。

    公开(公告)号:EP0080042A1

    公开(公告)日:1983-06-01

    申请号:EP82108786.3

    申请日:1982-09-22

    IPC分类号: G03F7/26

    CPC分类号: G03F7/322

    摘要: A developer comprising a surfactant, an organic solvent, an alkali agent of about 0.01 to 5 wt% of a watersoften- ing agent having a sequestering ratio of at least 50% at the pH of the developer and water to remove the unexposed area of said photosensitive layer, and a method of development comprising imagewise exposing a photosensitive material comprising a support having thereon a light-hardenable photosensitive layer including an organic high-molecular polymer with an acid value of 10 to 200, and processing the photosensitive material with the developer.

    摘要翻译: 一种显影剂,其包含表面活性剂,有机溶剂,约0.01至5重量%的在显色剂的pH下具有至少50%的螯合率的水溶性粘合剂的碱剂和水,以除去所述感光层的未曝光区域 以及显影方法,其包括使包含其上具有含有酸值为10-200的有机高分子聚合物的光可硬化感光层的载体成像曝光,并用显影剂处理感光材料。