公开(公告)号：EP1043320A4

公开(公告)日：2000-12-06

申请号：EP98944280

申请日：1998-09-28

申请人： FUJISAWA PHARMACEUTICAL CO

发明人： KAGARA KOOJI ,  HASHIMOTO NORIO ,  KANDA ATSUSHI ,  BABA YUKIHISA ,  FURUTERA TETSUO

IPC分类号： C07D295/32 ,  C07D295/22

CPC分类号： C07D295/32

摘要： A new industrial process for producing compounds of general formula (I) and salts thereof, excellent in the yield and purity of the products, shortened in the process steps, and realized without the intervention of any nitroso compound. In said formula, R1 is lower alkyl, aryl, ar(lower)alkoxyl or heterocyclic group, each of which may be substituted with halogen; and R2 is cyclo(lower)alkyl, aryl or ar(lower)alkyl, each of which may be substituted with halogen.

公开(公告)号：EP0994101A4

公开(公告)日：2002-05-02

申请号：EP98924609

申请日：1998-06-15

申请人： FUJISAWA PHARMACEUTICAL CO

发明人： ICHIHARA MASAHARU ,  HASHIMOTO NORIO ,  KANDA ATSUSHI ,  KAGARA KOOJI

IPC分类号： C07C227/06 ,  C07C229/34 ,  C07C229/38 ,  C07D261/08

CPC分类号： C07C227/06 ,  C07C229/38 ,  C07C229/34

摘要： A new process for producing compounds of general formula (I), wherein R1 is carboxyl or protected carboxyl; R2 is lower alkoxyl or higher alkoxyl; and A?1 and A2¿ are each an aromatic divalent group, a heterocyclic divalent group or a cyclo(lower)alkylene group or salts of them, characterized by producing compounds of general formula (II), wherein R?1, R2, A1 and A2¿ are eachas defined above or salts thereof from compounds of general formula (III), wherein R?1, R2, A1 and A2¿ are each as defined above or salts thereof and producing compounds of general formula (I) from those of formula (II) or salts thereof.

摘要翻译： 本发明涉及一种制备下式（I）化合物的新方法。 因此，制备式（I）的化合物的方法：其中R 1是羧基或被保护的羧基; R 2是低级烷氧基或更高级烷氧基; A 1是二价芳环，二价杂环基或二价环（低级）烷烃; 并且A 2是二价芳族环，二价杂环基或二价环（低级）烷烃或其盐，其包括使式（III）化合物：其中R 1，R 2， 2>，A 1和A 2各自如上所定义，或其盐与酸性铵盐反应，得到式（II）的化合物：其中R 1，R 2 >，A 1和A 2各自如上所定义，或其盐，进一步与羟胺盐反应。