公开(公告)号：EP1535496B1

公开(公告)日：2010-07-07

申请号：EP03792939.5

申请日：2003-05-21

申请人： Fusion Uv Systems, Inc.

发明人： LEZCANO, Pedro, A. ,  BARRY, Jonathan, D. ,  OKAMITSU, Jeffrey, K. ,  CEKIC, Miodrag

IPC分类号： H05B41/16 ,  H05B41/24 ,  H01J65/04

CPC分类号： H05B41/24 ,  H01J65/048

公开(公告)号：EP1535381A2

公开(公告)日：2005-06-01

申请号：EP03763020.9

申请日：2003-06-23

申请人： Fusion Uv Systems, Inc.

发明人： BARRY, Jonathan, D. ,  YEH, Ta Hai ,  ARMAN, Moossa Joseph

IPC分类号： H02H1/00

CPC分类号： H05B6/683 ,  H05B2206/044 ,  Y10T307/406 ,  Y10T307/414 ,  Y10T307/422 ,  Y10T307/43

摘要： A system and method are provided to power a plurality of magnetrons devices (30, 40). The system may include a power supply device (DC) to power a first magnetron device, a second magnetron device and a third magnetron device (100, 200, 300). A control device apportions an amount of current to each of the second and third magnetron devices.

公开(公告)号：EP1151640A1

公开(公告)日：2001-11-07

申请号：EP99957467.6

申请日：1999-10-29

申请人： Fusion Uv Systems, Inc.

发明人： BARRY, Jonathan, D.

IPC分类号： H05B41/24

CPC分类号： F26B3/28

摘要： An apparatus (R) for treating material with radiant energy, comprises a first reflector (6) having a first object focus disposed outside thereof; a second reflector (12) having a second object focus and disposed outside the first reflector (6); a radiant energy source (4) disposed inside the first reflector (6); and an auxiliary reflector (10) disposed at the first object focus.

公开(公告)号：EP1354386B1

公开(公告)日：2010-07-14

申请号：EP02700994.3

申请日：2002-01-02

申请人： Fusion Uv Systems, Inc.

发明人： PENZENSTADLER, Ernest, G. ,  BARRY, Jonathan, D. ,  OWEN, Gregory, H.

IPC分类号： H02J1/00

CPC分类号： H05B6/683 ,  H05B2206/044 ,  Y10T307/406 ,  Y10T307/422 ,  Y10T307/43

摘要： A system and method are provided to power two magnetrons devices. The system may include a power supply device (10) to power a first magnetron device and a second magnetron device. A control device may control an amount of current reaching at least the first magnetron device.

公开(公告)号：EP1535496A1

公开(公告)日：2005-06-01

申请号：EP03792939.5

申请日：2003-05-21

申请人： Fusion Uv Systems, Inc.

发明人： LEZCANO, Pedro, A. ,  BARRY, Jonathan, D. ,  OKAMITSU, Jeffrey, K. ,  CEKIC, Miodrag

IPC分类号： H05B41/16

CPC分类号： H05B41/24 ,  H01J65/048

摘要： A lamp assembly in accordance with the invention includes an electrodeless bulb (14) which is symmetrical about an axis (16) and which contains a light emissive fill which emits light when the bulb is excited by a RF electrical field coupled to the fill; an electrically conductive coupler (18) comprising a plurality of turns (20) which are symmetrical about an axis of the electrically conductive coupler, the turns defining a volume (19) that at least partially contains the bulb; and a conductor (26) connected to a center portion of the electrically conductive coupler with connection of the conductor to the electrically conductive coupler providing a fixing of the coupler relative to the bulb which, when the conductor is connected to a source of RF electrical potential, conducts a RF current producing a RF electrical potential on the electrically conductive coupler that produces the RF electrical field coupled to the light emissive fill.

公开(公告)号：EP1354386A1

公开(公告)日：2003-10-22

申请号：EP02700994.3

申请日：2002-01-02

申请人： Fusion Uv Systems, Inc.

发明人： PENZENSTADLER, Ernest, G. ,  BARRY, Jonathan, D. ,  OWEN, Gregory, H.

IPC分类号： H02J1/00

CPC分类号： H05B6/683 ,  H05B2206/044 ,  Y10T307/406 ,  Y10T307/422 ,  Y10T307/43

摘要： A system and method are provided to power two magnetrons devices. The system may include a power supply device (10) to power a first magnetron device and a second magnetron device. A control device may control an amount of current reaching at least the first magnetron device.