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1.发明公开PRODUCTION PROCESSES AND SYSTEMS, COMPOSITIONS, SURFACTANTS, MONOMER UNITS, METAL COMPLEXES, PHOSPHATE ESTERS, GLYCOLS, AQUEOUS FILM FORMING FOAMS, AND FOAM STABILIZERS 审中-公开生产系统，组合物，表面活性剂，单体，金属配合物，磷酸酯，乙二醇，水成膜泡沫以及泡沫稳定剂
公开(公告)号：EP1718722A2
公开(公告)日：2006-11-08
申请号：EP05712546.0
申请日：2005-01-28
发明人： BOGGS, Janet , BRANDSTADTER, Stephan, M. , CHIEN, John , SHARMA, Vimal , EDWARDS, Bradley, E. , HEDRICK, Victoria , JACKSON, Andrew , LEMAN, Gregory , NORMAN, Edward , KAUFMAN, Robert
CPC分类号： C07C17/278 , C07C19/08 , C07C19/10 , C07C19/14 , C07C19/16 , C07C21/18 , C11D1/004 , C11D3/0026 , C11D3/0094
摘要： Production processes and systems are provided that include reacting halogenated compounds, dehalogenating compounds, reacting alcohol’s, reacting olefins and a saturated compounds, reacting reactants having at least two -CF3 groups with reactants having cyclic groups. RF-compositions such as RF-intermediates, RF-surfactants, RF-monomers, RF-monomer units, RF-metal complexes, RF-phosphate esters, RF-glycols, RF-urethanes, and/or RF-foam stabilizers. The RF portion can include at least two -CF3 groups, at least three -CF3 groups, and/or at least two -CF3 groups and at least two -CH2- groups. Detergents, emulsifiers, paints, adhesives, inks, wetting agents, foamers, and defoamers including the RF-surfactant composition are provided. Acrylics, resins, and polymers are provided that include a RF-monomer unit. Compositions are provided that include a substrate having a RF-composition thereover. Aqueous Film Forming Foam ('AFFF') formulations are provided that can include RF-surfactants and/or RF-foam stabilizers are provided.
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2.发明公开PRODUCTION PROCESSES AND SYSTEMS, COMPOSITIONS, SURFACTANTS, MONOMER UNITS, METAL COMPLEXES, PHOSPHATE ESTERS, GLYCOLS, AQUEOUS FILM FORMING FOAMS, AND FOAM STABILIZERS 审中-公开生产系统，组合物，表面活性剂，单体，金属配合物，磷酸酯，乙二醇，水成膜泡沫以及泡沫稳定剂
公开(公告)号：EP1718586A2
公开(公告)日：2006-11-08
申请号：EP05712761.5
申请日：2005-01-28
发明人： BOGGS, Janet , BRANDSTADTER, Stephan, M. , CHIEN, John , COHN, Mitchel , EDWARDS, Bradley, E. , HEDRICK, Victoria , JACKSON, Andrew , LEMAN, Gregory , AMEDURI, Bruno , KOSTOV, George, K., App. 103, Rés. Le Mas Vaneau
IPC分类号： C07C17/06
摘要： Production processes and systems are provided that include reacting halogenated compounds, dehalogenating compounds, reacting alcohols, reacting olefins and a saturated compounds, reacting reactants having at least two -CF3 groups with reactants having cyclic groups. RF-compositions such as RF-intermediates, RF-surfactants, RF-monomers, RF-monomer units, RF-metal complexes, RF-phosphate esters, RF-glycols, RF-urethanes, and/or RF-foam stabilizers. The RF portion can include at least two -CF3 groups, at least three -CF3 groups, and/or at least two -CF3 groups and at least two -CH2- groups. Detergents, emulsifiers, paints, adhesives, inks, wetting agents, foamers, and defoamers including the RF-surfactant composition are provided. Acrylics, resins, and polymers are provided that include a RF-monomer unit. Compositions are provided that include a substrate having a RF-composition thereover. Aqueous Film Forming Foam ('AFFF') formulations are provided that can include RF-surfactants and/or RF-foam stabilizers are provided.
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