摘要:
An IC device to be newly developed has at least one first function block (11A-11C, 12A, 12B, 14) and at least one second function block (13A, 13B) in which the first and second function blocks of the to-be-newly developed IC device is formed in a single semiconductor substrate, and logic design data of the first function block is available and that of the second function block needs to be newly prepared at a start of fabrication of the IC device. The IC device is, in one embodiment of the present invention, fabricated by starting logic design (53) of the second function block to prepare logic design data of the second function block while doped layers are formed (55) in a semiconductor substrate for the first and second function blocks to provide a semi-completed IC chip, performing (57) mask design of wiring conductor pattern using the logic design data of the first function block and later obtained logic design data of said second function block to prepare mask design data for the IC device, and forming (57) conductor pattern using the mask design data on the semi-completed IC chip to complete a newly developed IC device.
摘要:
An IC device to be newly developed has at least one first function block (11A-11C, 12A, 12B, 14) and at least one second function block (13A, 13B) in which the first and second function blocks of the to-be-newly developed IC device is formed in a single semiconductor substrate, and logic design data of the first function block is available and that of the second function block needs to be newly prepared at a start of fabrication of the IC device. The IC device is, in one embodiment of the present invention, fabricated by starting logic design (53) of the second function block to prepare logic design data of the second function block while doped layers are formed (55) in a semiconductor substrate for the first and second function blocks to provide a semi-completed IC chip, performing (57) mask design of wiring conductor pattern using the logic design data of the first function block and later obtained logic design data of said second function block to prepare mask design data for the IC device, and forming (57) conductor pattern using the mask design data on the semi-completed IC chip to complete a newly developed IC device.