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    Scanning electron microscope
    1.
    发明公开
    Scanning electron microscope 失效
    扫描电子显微镜

    公开(公告)号：EP0735563A2

    公开(公告)日：1996-10-02

    申请号：EP96105108.3

    申请日：1996-03-29

    申请人： HITACHI, LTD.

    发明人： Kobaru, Atsushi ,  Otaka, Tadashi ,  Maeda, Tatsuya ,  Sasada, Katsuhiro

    IPC分类号： H01J37/22

    CPC分类号： H01J37/22 ,  H01J2237/216 ,  H01J2237/2482

    摘要： An electron beam 2 is focused on a specimen 6 by a focusing lens 5. A light beam 26 is incident on the position of irradiation of the specimen 6 with the electron beam 2 and the reflected light beam 28 is detected by a linear light detector 30. The output of the detector 30 is used to measure height of the specimen at the position of irradiation of the electron beam 2. The specimen 6 is moved in a plane perpendicular to an optical axis 36 of the focusing lens 5. A specimen height measuring device (31 to 34) carries out the height measurement of the specimen at a position to be observed on the specimen and at positions thereon which are in the vicinity of the position to be observed, when those positions are located at the position of irradiation of the electron beam. The specimen height measuring device 31 to 34 averages the measured values so as to produce a focusing correction signal on the basis thereof and controls the focusing lens 5 on the basis of the focusing correction signal.

    摘要翻译： 电子束2通过聚焦透镜5聚焦在样本6上。光束26入射到用电子束2照射样本6的位置，并且反射光束28由线性光检测器30检测 检测器30的输出用于测量在电子束2的照射位置处的样本的高度。样本6在垂直于聚焦透镜5的光轴36的平面内移动。样本高度测量 装置（31至34）在位于待观察位置附近的位置处的待观察位置处的待观察位置处进行样本的高度测量， 电子束。 样本高度测量装置31至34对测量值进行平均，以便基于该测量值产生聚焦校正信号，并且基于聚焦校正信号来控制聚焦透镜5。

    An electron beam apparatus
    2.
    发明公开
    An electron beam apparatus 失效
    电子束装置

    公开(公告)号：EP0641011A2

    公开(公告)日：1995-03-01

    申请号：EP94305950.1

    申请日：1994-08-11

    申请人： HITACHI, LTD.

    发明人： Todokoro, Hideo ,  Otaka, Tadashi ,  Maeda, Tatsuya ,  Sasada, Katsuhiro

    IPC分类号： H01J37/21 ,  H01J37/141

    CPC分类号： H01J37/21 ,  H01J2237/216 ,  H01J2237/2482

    摘要： An electron beam apparatus focusses an electron beam (1) onto a specimen (6) by means of an objective magnetic lens (2). In order to detect changes in the height of the specimen, a laser light beam (1) from a laser source (9) is incident on the specimen (6) and the reflected laser beam (11) is detected by a light detector (3). Any change in the height of the specimen (6) changes the path of the laser beam (11) to the detector (3). Therefore, by monitoring the detector (3), the focussing of the electron beam (1) on the specimen (6) can be controlled by varying the current to an excitation coil (31) of the objective magnetic lens (2) or by moving the specimen (6) via a mounting stage (10). At least one of the pole pieces (28,29) of the objective lens (2) is on the opposite side of the path of the laser beam to the source of the electron beam (1), so that the objective magnetic lens (2) may be close to the specimen (6), permitting a short focal length. Thus, the laser beam (11) may pass between the pole pieces (28,29). An optical microscope (39) may also be provided to permit the specimen (6) to be viewed. The viewing path of the optical microscope (39) extends through an opening (37A) in one or both of the pole pieces (28,29) of the objective magnetic lens (2).

    摘要翻译： 电子束装置借助于目标磁透镜（2）将电子束（1）聚焦到样本（6）上。 为了检测试样高度的变化，来自激光源（9）的激光束（1）入射到试样（6）上，并且反射的激光束（11）被光检测器（3） ）。 样品（6）高度的任何变化都会改变激光束（11）到探测器（3）的路径。 因此，通过监测检测器（3），可以通过改变到目标磁透镜（2）的励磁线圈（31）的电流或通过移动目标磁透镜（2）来控制电子束（1）在试样（6）上的聚焦 样本（6）经由安装台（10）移动。 物镜（2）的极片（28,29）中的至少一个位于激光束到电子束（1）的源的路径的相反侧，使得物镜磁性透镜（2 ）可能接近样品（6），允许短焦距。 因此，激光束（11）可以在极片（28,29）之间通过。 还可以提供光学显微镜（39）以允许观察样本（6）。 光学显微镜（39）的观察路径延伸穿过目标磁透镜（2）的一个或两个极片（28,29）中的开口（37A）。

    Scanning electron microscope
    3.
    发明公开
    Scanning electron microscope 失效

    公开(公告)号：EP0735563A3

    公开(公告)日：1997-03-19

    申请号：EP96105108.3

    申请日：1996-03-29

    申请人： HITACHI, LTD.

    发明人： Kobaru, Atsushi ,  Otaka, Tadashi ,  Maeda, Tatsuya ,  Sasada, Katsuhiro

    IPC分类号： H01J37/22

    CPC分类号： H01J37/22 ,  H01J2237/216 ,  H01J2237/2482

    摘要： An electron beam 2 is focused on a specimen 6 by a focusing lens 5. A light beam 26 is incident on the position of irradiation of the specimen 6 with the electron beam 2 and the reflected light beam 28 is detected by a linear light detector 30. The output of the detector 30 is used to measure height of the specimen at the position of irradiation of the electron beam 2. The specimen 6 is moved in a plane perpendicular to an optical axis 36 of the focusing lens 5. A specimen height measuring device (31 to 34) carries out the height measurement of the specimen at a position to be observed on the specimen and at positions thereon which are in the vicinity of the position to be observed, when those positions are located at the position of irradiation of the electron beam. The specimen height measuring device 31 to 34 averages the measured values so as to produce a focusing correction signal on the basis thereof and controls the focusing lens 5 on the basis of the focusing correction signal.

    An electron beam apparatus
    6.
    发明公开
    An electron beam apparatus 失效
    Elektronenstrahlgerät。

    公开(公告)号：EP0641011A3

    公开(公告)日：1995-04-19

    申请号：EP94305950.1

    申请日：1994-08-11

    申请人： HITACHI, LTD.

    发明人： Todokoro, Hideo ,  Otaka, Tadashi ,  Maeda, Tatsuya ,  Sasada, Katsuhiro

    IPC分类号： H01J37/21 ,  H01J37/141

    CPC分类号： H01J37/21 ,  H01J2237/216 ,  H01J2237/2482

    摘要： An electron beam apparatus focusses an electron beam (1) onto a specimen (6) by means of an objective magnetic lens (2). In order to detect changes in the height of the specimen, a laser light beam (1) from a laser source (9) is incident on the specimen (6) and the reflected laser beam (11) is detected by a light detector (3). Any change in the height of the specimen (6) changes the path of the laser beam (11) to the detector (3). Therefore, by monitoring the detector (3), the focussing of the electron beam (1) on the specimen (6) can be controlled by varying the current to an excitation coil (31) of the objective magnetic lens (2) or by moving the specimen (6) via a mounting stage (10). At least one of the pole pieces (28,29) of the objective lens (2) is on the opposite side of the path of the laser beam to the source of the electron beam (1), so that the objective magnetic lens (2) may be close to the specimen (6), permitting a short focal length. Thus, the laser beam (11) may pass between the pole pieces (28,29). An optical microscope (39) may also be provided to permit the specimen (6) to be viewed. The viewing path of the optical microscope (39) extends through an opening (37A) in one or both of the pole pieces (28,29) of the objective magnetic lens (2).

    摘要翻译： 电子束装置通过物镜磁性透镜（2）将电子束（1）聚焦到试样（6）上。 为了检测样本高度的变化，来自激光源（9）的激光束（1）入射到检体（6）上，反射激光束（11）由光检测器（3）检测 ）。 样品（6）的高度的任何变化将激光束（11）的路径改变到检测器（3）。 因此，通过监视检测器（3），可以通过改变到物镜磁性透镜（2）的激励线圈（31）的电流或通过移动来控制电子束（1）在样本（6）上的聚焦 所述试样（6）经由安装台（10）。 物镜（2）的极片（28,29）中的至少一个位于激光束到电子束（1）源的路径的相反侧，使得物镜磁性透镜 ）可能靠近样本（6），允许短焦距。 因此，激光束（11）可以在极片（28,29）之间通过。 还可以设置光学显微镜（39）以允许观察样品（6）。 光学显微镜（39）的观察路径延伸穿过物镜磁性透镜（2）的一个或两个极片（28,29）中的开口（37A）。