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1.发明公开Poly(3-mono- and 3,5-disubstituted-4-acetoxystyrenes and 4-hydroxy-styrenes)and their use 失效聚（3-mono oder 3,5-disubstituierte acetoxystyrole）和deren Verwendung。
公开(公告)号：EP0307752A2
公开(公告)日：1989-03-22
申请号：EP88114475.2
申请日：1988-09-05
发明人： Vicari, Richard, Dipl.-Chem. , Gordon, Douglas J., Dipl.-Chem. , Rupp, Raymond W., Dipl.-Chem. , Dammel, Ralph, Dr. Dipl.-Chem. , Dössel, Karl-Friedrich, Dr. Dipl.-Chem. , Lingnau, Jürgen, Dr. Dipl.-Chem. , Lockard, James P., Dipl.-Chem. , Aslam, Mohammed, Dipl.-Chem. , Ray, Wilson B., Dipl.-Chem. , Davenport, Kenneth G., Dipl.-Chem.
CPC分类号： C08F12/22 , G03F7/0233
摘要： The invention provides poly(3-mono- and 3,5-disubstituted-4-acetoxy- and 4-hydroxystyrenes) and copolymers therefrom having a molecular weight in the range of from about 1,000 to about 800,000 wherein said 3-mono and 3,5-substitution is independently C₁ to C₁₀ alkyl or alkoxy, primary or secondary amino, halogen (Br, Cl, I), NO₂ or SO₃H.
The polymers are used as a binder resin in photosensitive compositions, wherein the light-sensitive compound is an o-quinone diazide or as an acid-forming radiation-sensitive compound in combination with a compound cleavable by acid.摘要翻译： 本发明提供分子量为约1,000至约800,000的聚（3-单 - 和3,5-二取代-4-乙酰氧基 - 和4-羟基苯乙烯）及其共聚物，其中所述3-单和三 - 5-取代独立地为C1至C10烷基或烷氧基，伯或仲氨基，卤素（Br，Cl，I），NO2或SO3H。 聚合物用作光敏组合物中的粘合剂树脂，其中光敏化合物是邻醌二叠氮化物或作为酸形成辐射敏感化合物与可被酸切割的化合物组合。
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2.发明公开Poly(3-mono- and 3,5-disubstituted-4-acetoxystyrenes and 4-hydroxy-styrenes)and their use 失效聚（3-单取代和3,5-取代-4-乙氧基苯乙烯和4-羟基苯乙烯）及其用途
公开(公告)号：EP0307752A3
公开(公告)日：1990-05-16
申请号：EP88114475.2
申请日：1988-09-05
发明人： Vicari, Richard, Dipl.-Chem. , Gordon, Douglas J., Dipl.-Chem. , Rupp, Raymond W., Dipl.-Chem. , Dammel, Ralph, Dr. Dipl.-Chem. , Dössel, Karl-Friedrich, Dr. Dipl.-Chem. , Lingnau, Jürgen, Dr. Dipl.-Chem. , Lockard, James P., Dipl.-Chem. , Aslam, Mohammed, Dipl.-Chem. , Ray, Wilson B., Dipl.-Chem. , Davenport, Kenneth G., Dipl.-Chem.
CPC分类号： C08F12/22 , G03F7/0233
摘要： The invention provides poly(3-mono- and 3,5-disubstituted-4-acetoxy- and 4-hydroxystyrenes) and copolymers therefrom having a molecular weight in the range of from about 1,000 to about 800,000 wherein said 3-mono and 3,5-substitution is independently C₁ to C₁₀ alkyl or alkoxy, primary or secondary amino, halogen (Br, Cl, I), NO₂ or SO₃H. The polymers are used as a binder resin in photosensitive compositions, wherein the light-sensitive compound is an o-quinone diazide or as an acid-forming radiation-sensitive compound in combination with a compound cleavable by acid.
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3.发明授权Poly(3-mono- and 3,5-disubstituted-4-acetoxystyrenes and 4-hydroxy-styrenes)and their use 失效聚（3-单或3,5-双取代acetoxystyrole）和它们的用途。
公开(公告)号：EP0307752B1
公开(公告)日：1995-02-22
申请号：EP88114475.2
申请日：1988-09-05
发明人： Vicari, Richard, Dipl.-Chem. , Gordon, Douglas J., Dipl.-Chem. , Rupp, Raymond W., Dipl.-Chem. , Dammel, Ralph, Dr. Dipl.-Chem. , Dössel, Karl-Friedrich, Dr. Dipl.-Chem. , Lingnau, Jürgen, Dr. Dipl.-Chem. , Lockard, James P., Dipl.-Chem. , Aslam, Mohammed, Dipl.-Chem. , Ray, Wilson B., Dipl.-Chem. , Davenport, Kenneth G., Dipl.-Chem.
CPC分类号： C08F12/22 , G03F7/0233
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