公开(公告)号：EP1130539B1

公开(公告)日：2006-06-14

申请号：EP00117780.7

申请日：2000-08-18

申请人： Hewlett-Packard Company A Delaware Corporation

发明人： Miquel, Antoni Gil ,  Gracia, Joan Manuel ,  Zapata, Elizabeth ,  Baharav, Izhak ,  Shaked, Doron ,  Garcia, Santiago

IPC分类号： G06K15/10 ,  B41J2/165

CPC分类号： H04N1/128 ,  G06K15/107 ,  G06K2215/0085 ,  G06K2215/111 ,  H04N1/1906 ,  H04N1/1911

公开(公告)号：EP1130539A3

公开(公告)日：2002-09-25

申请号：EP00117780.7

申请日：2000-08-18

申请人： Hewlett-Packard Company, A Delaware Corporation

发明人： Miquel, Antoni Gil ,  Gracia, Joan Manuel ,  Zapata, Elizabeth ,  Baharav, Izhak ,  Shaked, Doron ,  Gracia, Santiago

IPC分类号： G06K15/10 ,  B41J2/165

CPC分类号： H04N1/128 ,  G06K15/107 ,  G06K2215/0085 ,  G06K2215/111 ,  H04N1/1906 ,  H04N1/1911

摘要： One invention aspect forms a mask and matrix of corresponding backups for values in the mask, checks when a mask value is not working, and replaces only that value with only a matching matrix entry. A second matrix of further backups is best formed. Another aspect forms a mask as a matrix of stacks of matching entries for mask positions; selects an entry for each position from the matching matrix stack; and prints using the selected entry at each position. Preferably the selecting includes rotating the stack; and applying to each entry a selection probability related to numerical weighting of printing elements; reflect firing-frequency limitation has higher authority than weights. Another aspect forms a mask as a matrix of stacks of matching entries for mask positions, and rotates each stack to select an entry for each position. Another aspect forms a mask and a matrix of stacks of backups; finds nonworking mask values and replaces such values with backups from a matching stack. Another aspect forms a seminal mask, tiles it to make a larger one with related properties, and injects noise to disrupt tiling-caused regularity and form a less-regular mask. Preferably the mask is cubical, each side a number of pixels or layers about equal to number of passes.

公开(公告)号：EP1130539A2

公开(公告)日：2001-09-05

申请号：EP00117780.7

申请日：2000-08-18

申请人： Hewlett-Packard Company, A Delaware Corporation

发明人： Miquel, Antoni Gil ,  Gracia, Joan Manuel ,  Zapata, Elizabeth ,  Baharav, Izhak ,  Shaked, Doron ,  Gracia, Santiago

IPC分类号： G06K15/10

CPC分类号： H04N1/128 ,  G06K15/107 ,  G06K2215/0085 ,  G06K2215/111 ,  H04N1/1906 ,  H04N1/1911

摘要： One invention aspect forms a mask and matrix of corresponding backups for values in the mask, checks when a mask value is not working, and replaces only that value with only a matching matrix entry. A second matrix of further backups is best formed. Another aspect forms a mask as a matrix of stacks of matching entries for mask positions; selects an entry for each position from the matching matrix stack; and prints using the selected entry at each position. Preferably the selecting includes rotating the stack; and applying to each entry a selection probability related to numerical weighting of printing elements; reflect firing-frequency limitation has higher authority than weights. Another aspect forms a mask as a matrix of stacks of matching entries for mask positions, and rotates each stack to select an entry for each position. Another aspect forms a mask and a matrix of stacks of backups; finds nonworking mask values and replaces such values with backups from a matching stack. Another aspect forms a seminal mask, tiles it to make a larger one with related properties, and injects noise to disrupt tiling-caused regularity and form a less-regular mask. Preferably the mask is cubical, each side a number of pixels or layers about equal to number of passes.

摘要翻译： 一个发明方面形成掩模中值的相应备份的掩码和矩阵，检查掩码值何时不起作用，并且仅用匹配的矩阵条目替换该值。 进一步备份的第二个矩阵最好形成。 另一方面形成掩模作为掩模位置的匹配条目的堆栈的矩阵; 从匹配矩阵堆栈中选择每个位置的条目; 并使用所选条目在每个位置进行打印。 优选地，选择包括旋转堆叠; 并且向每个条目应用与打印元件的数值加权相关的选择概率; 反射射频限制比权重更高。 另一方面形成掩模作为掩模位置的匹配条目的堆叠的矩阵，并且旋转每个堆栈以为每个位置选择条目。 另一方面形成了一个掩码和一堆备份的矩阵; 找到非工作掩码值，并使用匹配堆栈的备份替换此类值。 另一方面形成了一个精液掩模，将其拼贴成一个具有相关属性的较大的掩模，并注入噪声以破坏平铺引起的规律性并形成一个较不规则的掩模。 优选地，所述掩模是立方体的，每侧都有大约等于通过次数的多个像素或层。