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公开(公告)号:EP1738210A1
公开(公告)日:2007-01-03
申请号:EP05735362.5
申请日:2005-04-11
申请人: Intralase Corp.
IPC分类号: G02B15/14
CPC分类号: A61F9/009 , A61F9/008 , A61F9/00802 , A61F9/00825 , A61F2009/00844 , A61F2009/00855 , A61F2009/00872 , A61F2009/00891 , G02B7/10 , G02B7/28
摘要: A closed-loop focusing system and method positions a focusing assembly (26) to a desired positioned. A feedback positioning device (12), such as a linear encoder, provides an actual or 'read' value for the linear movement of the focusing assembly. The desired position is compared to the actual position of the focusing assembly. If the two values are outside of a predetermined tolerance or valid range, then an audible or visual warning will be given. When a laser source (41) is utilized with the focusing system, laser operation will be prevented if the two values are outside of an acceptable range. However, if the difference between the desired position and the actual position are within an acceptable range, the focusing assembly is repositioned to allow real-time systematic correction of the position of the focusing assembly.
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公开(公告)号:EP1487368B1
公开(公告)日:2007-06-27
申请号:EP03714328.6
申请日:2003-03-21
申请人: Intralase Corp.
发明人: KURTZ, Ronald, M. , JUHASZ, Tibor , GOLDSTEIN, Peter , HEGEDUS, Imre , SCHOLLER, Gordon, Scott , BERG, Alan, W. , HORVATH, Christopher
CPC分类号: A61F9/008 , A61F9/00827 , A61F9/00836 , A61F2009/00872 , A61F2009/00897
摘要: A method and system (10) for improved material processing using a laser beam (12). The method and system includes directing a laser beam (12) above, at or below the surface of the material in one or more preferred patterns and with preferred laser pulse characteristics specific to the material to reduce or mitigate the accumulation or effects of gas, debris, fluid, or other byproducts of photodisruption either at the location where additional laser pulses are being placed or in other sensitive locations in the material. One embodiment of a reservoir (62) is shown formed adjacent to a pattern cut (60), the primary pattern (60) is made as a raster pattern for the horizontal resection. Other pattern may be used for the primary pattern.
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公开(公告)号:EP1389070A2
公开(公告)日:2004-02-18
申请号:EP02764253.7
申请日:2002-04-19
申请人: Intralase Corp.
IPC分类号: A61F2/00
CPC分类号: A61F9/008 , A61B90/90 , A61F9/00825 , A61F2009/00872 , A61F2009/00897
摘要: A method, system (10) and apparatus for computer-controlled photodisruption of tissue of the eye is provided. Instrument software is implemented on a computer-based laser system (21) to control operation of the laser system and provide managed, secured control of photodisruption procedures. The instrument software (10) is configured for the display (14) of an image of a patient's eye within a graphical user interface of the instrument software. Parameters for both horizontal and vertical resections are selectable by the user of the instrument software. The parameters are used to control procedures for the photodisruption of tissue of the eye. In addition to the performance of photodisruption procedures, the instrument software (10) provides for maintenance, security, calibration, and error monitoring functions.
摘要翻译: 提供了用于眼睛组织的计算机控制的光致破裂的方法,系统(10)和设备。 仪器软件在基于计算机的激光系统(21)上实施,以控制激光系统的操作并提供对光致破裂程序的管理,安全控制。 仪器软件(10)被配置用于仪器软件的图形用户界面内的患者眼睛图像的显示器(14)。 仪器软件的用户可以选择水平和垂直切除的参数。 这些参数用于控制眼睛组织的光致破坏程序。 仪器软件(10)除了执行光致破裂程序外,还提供维护,安全,校准和错误监测功能。
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公开(公告)号:EP1487368A2
公开(公告)日:2004-12-22
申请号:EP03714328.6
申请日:2003-03-21
申请人: Intralase Corp.
发明人: KURTZ, Ronald, M. , JUHASZ, Tibor , GOLDSTEIN, Peter , HEGEDUS, Imre , SCHOLLER, Gordon, Scott , BERG, Alan, W. , HORVATH, Christopher
IPC分类号: A61B18/18
CPC分类号: A61F9/008 , A61F9/00827 , A61F9/00836 , A61F2009/00872 , A61F2009/00897
摘要: A method and system (10) for improved material processing using a laser beam (12). The method and system includes directing a laser beam (12) above, at or below the surface of the material in one or more preferred patterns and with preferred laser pulse characteristics specific to the material to reduce or mitigate the accumulation or effects of gas, debris, fluid, or other byproducts of photodisruption either at the location where additional laser pulses are being placed or in other sensitive locations in the material. One embodiment of a reservoir (62) is shown formed adjacent to a pattern cut (60), the primary pattern (60) is made as a raster pattern for the horizontal resection. Other pattern may be used for the primary pattern.
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公开(公告)号:EP1444542A2
公开(公告)日:2004-08-11
申请号:EP02757515.8
申请日:2002-08-30
申请人: Intralase Corp.
CPC分类号: G02B7/28 , A61F9/008 , A61F9/00802 , A61F9/00825 , A61F9/009 , A61F2009/00844 , A61F2009/00855 , A61F2009/00872 , A61F2009/00891
摘要: A closed-loop focusing system and method positions a focusing assembly (26) to a desired positioned. A feedback positioning device (12), such as a linear encoder, provides an actual or 'read' value for the linear movement of the focusing assembly. The desired position is compared to the actual position of the focusing assembly. If the two values are outside of a predetermined tolerance or valid range, then an audible or visual warning will be given. Furthermore, when a laser source (41) is utilized with the focusing system, then laser operation will be prevented where the two values are outside of tolerance.
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