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公开(公告)号：EP2551003A1
公开(公告)日：2013-01-30
申请号：EP12189632.8
申请日：2008-02-05
发明人： Kwok, Kleo
CPC分类号： A62B23/025 , B01D29/012 , B01D29/111 , B01D46/0001 , B01D46/40
摘要： Selective etching techniques are used to manufacture a basic filtration element, which can then be used as a basis for constructing various devices for different applications. In this process, sheets of etchable material are etched from one or both sides of that sheet to form channels in a premasked pattern, which controls the minimum opening of the filtration element. The desired channel opening is only limited by the capability of the photochemical etching system being used. Alternatively, a filter element may be made by rolling or extruding a first sheet to form a plurality of recessed areas bordered by lands, selectively etching or punching through the recessed pattern areas, and bonding a second sheet having a plurality of etched or punched through areas to the first sheet, and, aligning the etched through areas to the second sheet with the recessed areas of the first sheet.
摘要翻译： 选择性蚀刻技术用于制造基本过滤元件，然后可以将其用作构造用于不同应用的各种装置的基础。 在该过程中，从该片的一面或两面蚀刻可蚀刻材料片以形成预掩模图案的通道，该通道控制过滤元件的最小开口。 期望的通道开口仅受使用的光化学蚀刻系统的能力的限制。 或者，可以通过滚压或挤压第一片材来形成过滤元件，以形成多个凹陷区域，所述多个凹陷区域由凸区界定，选择性地蚀刻或穿过凹陷的图案区域，并且接合具有多个蚀刻或穿透区域的第二片材 到第一片材，并且将蚀刻的贯穿区域与第一片材的凹陷区域对准到第二片材。
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公开(公告)号：EP2551003B1
公开(公告)日：2015-12-09
申请号：EP12189632.8
申请日：2008-02-05
发明人： Kwok, Kleo
CPC分类号： A62B23/025 , B01D29/012 , B01D29/111 , B01D46/0001 , B01D46/40
摘要： Selective etching techniques are used to manufacture a basic filtration element, which can then be used as a basis for constructing various devices for different applications. In this process, sheets of etchable material are etched from one or both sides of that sheet to form channels in a premasked pattern, which controls the minimum opening of the filtration element. The desired channel opening is only limited by the capability of the photochemical etching system being used. Alternatively, a filter element may be made by rolling or extruding a first sheet to form a plurality of recessed areas bordered by lands, selectively etching or punching through the recessed pattern areas, and bonding a second sheet having a plurality of etched or punched through areas to the first sheet, and, aligning the etched through areas to the second sheet with the recessed areas of the first sheet.
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