公开(公告)号：EP1057859A3

公开(公告)日：2000-12-20

申请号：EP00111681.3

申请日：2000-05-31

申请人： JSR Corporation

发明人： Nishimura, Isao, c/o JSR Corporation ,  Suzuki, Masayoshi, c/o JSR Corporation ,  Yonezawa, Fumiko, c/o JSR Corporation ,  Endo, Masayuki, c/o JSR Corporation

IPC分类号： C08K5/28 ,  C08L33/06 ,  G03F7/039

CPC分类号： G03F7/0755 ,  C08K5/28 ,  G03F7/0233 ,  C08L33/068

摘要： A radiation sensitive resin composition which can be processed and molded at low temperatures and has resolution, solvent resistance, adhesion to a substrate and storage stability required as an interlaminar insulating film. This radiation sensitive resin composition comprises: (A) a copolymer obtained by copolymerizing (a1) an unsaturated carboxylic acid and/or an unsaturated carboxylic anhydride, (a2) an epoxy compound such as β-methylglycidyl acrylate and/or an epoxy compound such as a monomer represented by the following formula (3): and (a3) an olefinic unsaturated compound other than the above (a1) and (a2); and (B) a 1,2-quinonediazide compound.

摘要翻译： 本发明提供一种能够在低温下进行加工成型且具有分辨率，耐溶剂性，对基材的密合性，作为层间绝缘膜所需的保存稳定性的感放射线性树脂组合物。 该感放射线性树脂组合物含有：（A）将（a1）不饱和羧酸和/或不饱和羧酸酐与（a2）环氧化合物如β-甲基丙烯酸缩水甘油酯和/或环氧化合物如 （3）表示的单体：（a3）除上述（a1）和（a2）以外的烯属不饱和化合物; 和（B）1,2-醌二叠氮化合物。