公开(公告)号：EP2657957B1

公开(公告)日：2020-03-11

申请号：EP11849995.3

申请日：2011-12-21

申请人： Kabushiki Kaisha Watanabe Shoko ,  Kusuhara, Masaki ,  Umeda, Masaru ,  Toda, Masayuki

发明人： KUSUHARA, Masaki ,  UMEDA, Masaru ,  TODA Masayuki ,  FUKAGAWA, Mitsuru

IPC分类号： C23C16/448 ,  C23C16/455 ,  B01D1/00

公开(公告)号：EP2657957A1

公开(公告)日：2013-10-30

申请号：EP11849995.3

申请日：2011-12-21

申请人： Kabushiki Kaisha Watanabe Shoko ,  Kusuhara, Masaki ,  Umeda, Masaru ,  Toda, Masayuki

发明人： KUSUHARA, Masaki ,  UMEDA, Masaru ,  TODA Masayuki ,  FUKAGAWA, Mitsuru

IPC分类号： H01L21/31 ,  C23C16/448

CPC分类号： C23C16/4481 ,  B01D1/00

摘要： Provided is a vaporizer that can reduce ripples, particles, and a carbon content of a film and can supply a raw material capable of forming a film having a desired composition. Moreover, a vaporizer is obtained that sufficient vaporization can be performed without heating more than necessary and temperature management can be facilitated. A vaporizer includes a vaporizer main body (3) into which a carrier gas having a film forming liquid material dispersed is introduced and a heater main body (4) disposed in the vaporizer main body (3). The shape of the inlet portion of the heater main body is in a cone.

摘要翻译： 提供一种蒸发器，其可以减少膜的波纹，颗粒和碳含量，并且可以提供能够形成具有期望组成的膜的原料。 此外，获得能够在不需要加热的情况下进行充分蒸发的蒸发器，并且可以促进温度管理。 蒸发器包括引入分散有成膜液体材料的载气的蒸发器主体（3）和设置在蒸发器主体（3）中的加热器主体（4）。 加热器主体的入口部分的形状为锥形。

公开(公告)号：EP2154711A1

公开(公告)日：2010-02-17

申请号：EP08752777.6

申请日：2008-05-15

申请人： Kabushiki Kaisha Watanabe Shoko ,  Toda, Masayuki

发明人： TODA, Masayuki ,  KUSUHARA, Masaki ,  UMEDA, Masaru ,  FUKAGAWA, Mitsuru

IPC分类号： H01L21/205 ,  C23C16/448

CPC分类号： C23C16/407 ,  C23C16/4486

摘要： Because an evaporating apparatus for use in an MOCVD film deposition system has a structure in which a plurality of gas passages brings in a gas from the upper direction, the apparatus has a difficulty to position a jet nozzle, and the apparatus is incapable of accurately controlling the pressure and flow rate of a carrier gas mixed with a raw material solution to be issued into an evaporating unit, and it is thus difficult to highly accurately control the composition of MOCVD films. A plurality of gas passages is arranged on a flat, disk-shaped plate. With this configuration, the accurate positioning of the jet nozzle can be made easier, and the composition of MOCVD films can be controlled highly accurately.

摘要翻译： 由于用于MOCVD膜沉积系统的蒸发装置具有多个气体通道从上方引入气体的结构，所以该装置难以定位喷嘴，并且该装置不能精确地控制 与要发放到蒸发单元中的原料溶液混合的载气的压力和流速，因此难以高精度地控制MOCVD膜的组成。 多个气体通道设置在平坦的盘形板上。 利用这种结构，可以使喷嘴的精确定位变得更容易，并且可以高精度地控制MOCVD膜的组成。

公开(公告)号：EP2154711B1

公开(公告)日：2013-10-16

申请号：EP08752777.6

申请日：2008-05-15

申请人： Kabushiki Kaisha Watanabe Shoko ,  Toda, Masayuki

发明人： TODA, Masayuki ,  KUSUHARA, Masaki ,  UMEDA, Masaru ,  FUKAGAWA, Mitsuru

IPC分类号： H01L21/205 ,  C23C16/448

CPC分类号： C23C16/407 ,  C23C16/4486

摘要： Because an evaporating apparatus for use in an MOCVD film deposition system has a structure in which a plurality of gas passages brings in a gas from the upper direction, the apparatus has a difficulty to position a jet nozzle, and the apparatus is incapable of accurately controlling the pressure and flow rate of a carrier gas mixed with a raw material solution to be issued into an evaporating unit, and it is thus difficult to highly accurately control the composition of MOCVD films. A plurality of gas passages is arranged on a flat, disk-shaped plate. With this configuration, the accurate positioning of the jet nozzle can be made easier, and the composition of MOCVD films can be controlled highly accurately.