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公开(公告)号:EP4094828A1
公开(公告)日:2022-11-30
申请号:EP21744361.3
申请日:2021-01-22
摘要: Disclosed is a plasma surface treatment apparatus for conductive powder. The plasma surface treatment apparatus for conductive powder comprises: a reaction chamber including a linear gas inlet at the lower end thereof and a gas outlet at the upper end thereof, and having a vertical cross section that is funnel-shaped; and a plasma jet generation device that is located below the linear gas inlet and is configured to discharge a plasma jet into the reaction chamber from below in an upward direction through the linear gas inlet, wherein powder is accommodated in the reaction chamber and is treated by plasma while buoyed by the plasma jet.
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公开(公告)号:EP3952618A1
公开(公告)日:2022-02-09
申请号:EP21197401.9
申请日:2016-02-05
发明人: SEOK, Dong Chan , JUNG, Yong Ho , CHOI, Yong Sup , LHO, Taihyeop , LEE, Kang Il , JEONG, Hyun Young
IPC分类号: H05H1/24
摘要: The present invention is to provide a plasma-generating source including a porous dielectric member partially immersed in liquid into a plasma generation region between two opposite electrodes for generating dielectric barrier discharge plasma, such that generation of ozone and nitrogen oxides is suppressed while generation of hydroxy radicals is promoted.
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