METHOD FOR PRODUCING ALLOY DEPOSITS AND CONTROLLING THE NANOSTRUCTURE THEREOF USING NEGATIVE CURRENT PULSING ELECTRO-DEPOSITION
    1.
    发明授权
    METHOD FOR PRODUCING ALLOY DEPOSITS AND CONTROLLING THE NANOSTRUCTURE THEREOF USING NEGATIVE CURRENT PULSING ELECTRO-DEPOSITION 有权
    使用负电流脉冲电沉积生产合金沉积物并控制其纳米结构的方法

    公开(公告)号:EP1899505B1

    公开(公告)日:2017-12-20

    申请号:EP06844106.2

    申请日:2006-05-23

    IPC分类号: C25D3/56 C25D5/18

    摘要: Bipolar wave current, with both positive and negative current portions, is used to electrodeposit a nanocrystalline grain size deposit. Polarity Ratio is the ratio of the absolute value of the time integrated amplitude of negative polarity current and positive polarity current. Grain size can be precisely controlled in alloys of two or more chemical components, at least one of which is a metal, and at least one of which is most electro-active. Typically, although not always, the amount of the more electro-active material is preferentially lessened in the deposit during times of negative current. The deposit also exhibits superior macroscopic quality, being relatively crack and void free. Parameters of current density, duration of pulse portions, and composition of the bath are determined with reference to constitutive relations showing grain size as a function of deposit composition, and deposit composition as a function of Polarity Ratio, or, perhaps, a single relation showing grain size as a function of Polarity ratio.

    SILICON-RICH ALLOYS
    2.
    发明公开
    SILICON-RICH ALLOYS 有权
    富含硅的合金

    公开(公告)号:EP2467506A1

    公开(公告)日:2012-06-27

    申请号:EP10749701.8

    申请日:2010-08-19

    IPC分类号: C22C28/00

    CPC分类号: C22C28/00

    摘要: Castable silicon-based compositions have enhanced toughness and related properties compared to silicon. The silicon-based compositions comprise silicon at a concentration greater than 50% by weight and one or more additional elements in structure comprising a cubic silicon phase and an additional phase which may impart toughness through mechanisms related to plastic flow or crack interaction with interfacial boundaries.

    METHODS FOR TAILORING THE SURFACE TOPOGRAPHY OF A NANOCRYSTALLINE OR AMORPHOUS METAL OR ALLOY AND ARTICLES FORMED BY SUCH METHODS
    4.
    发明公开
    METHODS FOR TAILORING THE SURFACE TOPOGRAPHY OF A NANOCRYSTALLINE OR AMORPHOUS METAL OR ALLOY AND ARTICLES FORMED BY SUCH METHODS 审中-公开
    纳米晶态或非晶态金属或纳米晶态或非晶态合金的方法作物的表面形貌和采用这种工艺生产的文章

    公开(公告)号:EP2092092A1

    公开(公告)日:2009-08-26

    申请号:EP07875205.2

    申请日:2007-11-14

    摘要: Electrochemical etching tailors topography of a nanocrystalline or amorphous metal or alloy, which may be produced by any method including, by electrochemical deposition. Common etching methods can be used. Topography can be controlled by varying parameters that produce the item or the etching parameters or both. The nanocrystalline article has a surface comprising at least two elements, at least one of which is metal, and one of which is more electrochemically active than the others. The active element has a definite spatial distribution in the workpiece, which bears a predecessor spatial relationship to the specified topography. Etching removes a portion of the active element preferentially, to achieve the specified topography. Control is possible regarding: roughness, color, particularly along a spectrum from silver through grey to black, reflectivity and the presence, distribution and number density of pits and channels, as well as their depth, width, size. Processing parameters that have been correlated in the Ni-W system to topography features include, for both the deposition phase and the etching phase of a nanocrystalline surface: duty cycle, current density, deposition duration, plating chemistry, polarity ratio. The relative influence of the processing parameters can be noted and correlated to establish a relationship between values for processing parameters and degree of topography feature. Control can be established over the topography features. Correlation can be made for any such system that exhibits a definite spatial distribution of an active element that bears a predecessor spatial relationship to a desired topography feature.

    METHOD FOR PRODUCING ALLOY DEPOSITS AND CONTROLLING THE NANOSTRUCTURE THEREOF USING NEGATIVE CURRENT PULSING ELECTRO-DEPOSITION, AND ARTICLES INCORPORATING SUCH DEPOSITS
    5.
    发明公开

    公开(公告)号:EP1899505A2

    公开(公告)日:2008-03-19

    申请号:EP06844106.2

    申请日:2006-05-23

    IPC分类号: C25D3/56

    摘要: Bipolar (pulse reversal) current, with both positive and negative current portions, is used to electrodeposit a nanocrystalline grain size deposit. Polarity Ratio is the ratio of the absolute value of the time integrated amplitude of negative polarity current and positive polarity current. Grain size can be precisely controlled in alloys. The deposit exhibits superior macroscopic quality, being relatively crack and void free. Parameters of current density, duration of pulse portions, and composition of the bath are determined with reference to constitutive relations showing grain size as a function of deposit composition, and deposit composition as a function of Polarity Ratio. The parameters can be used to select a specified grain size. Coatings can be in layers, each having an average grain size, which can vary layer to layer and also in a region in a graded fashion.

    摘要翻译: 双极波电流,具有两个正和负电流部分时,使用电沉积纳米晶粒尺寸存款。 极性比例是负极性电流和正极性电流的时间积分振幅的绝对值的比率。 晶粒尺寸可精确地在两个或更多个化学成分,合金被控制的所有这是一种金属的至少一种,并且所有这是大多数电活性的至少一种。 通常情况下,虽然不总是,越电活性材料的量优选地在存款过程中的负电流的时间减少。 因此,该存款表现出优良的宏观质量,是相对裂缝和无空隙。 电流密度,脉冲部分的持续时间和浴的组合物的参数被确定性开采参考示出作为存款组成的函数粒度本构关系,和存款组合物作为极性比例的函数,或者,也许,一个单一的关系示出 晶粒尺寸的极性比的函数。