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公开(公告)号:EP1246223A4
公开(公告)日:2005-11-23
申请号:EP00985919
申请日:2000-12-26
发明人: MURAI RYUICHI , HATTA SHINICHIRO , IWAMOTO HIROSHI , NAKADERA SHIGEO , YONEZAWA TAKAYUKI , MIKAMI TOMOHISA
CPC分类号: H01J29/06 , H01J29/073 , H01J2229/003
摘要: An internal magnetic shield reduced in mistaken landing length due to distorted electron beams by the external magnetic field of geomagnetism or the like, and also reduced in color misregister and color unevenness. The internal magnetic shield is provided with at least one skirt unit (37) in an externally square tube shape having a plurality of side surface and extending from a non-contact portion with a holding member (42) up to the vicinity of a tension member (41), the skirt unit (37) being magnetically coupled with the tension member (41) constituting a mask frame.
摘要翻译: 由于地磁等外部磁场引起的电子束畸变,导致错误着落长度的内部磁屏蔽减少,并且还减少了颜色不对准和颜色不均匀性。 内部磁屏蔽设置有至少一个外部方管形状的裙部单元(37),所述裙部单元具有多个侧表面并且从与保持构件(42)的非接触部分延伸直至受拉构件 (41),裙部单元(37)与构成荫罩框架的受拉构件(41)磁性耦合。