公开(公告)号：EP1661665A1

公开(公告)日：2006-05-31

申请号：EP04747642.9

申请日：2004-07-09

申请人： MATSUSHITA ELECTRIC INDUSTRIAL CO., LTD. ,  Nishihara, Kazunari

发明人： NISHIHARA, Kazunari ,  KURIYAGAWA, Tsunemoto

IPC分类号： B24B37/00

CPC分类号： B24B37/16

摘要： A viscoelastic polisher to be used for polishing. The viscoelastic polisher includes a viscoelastic layer provided on a major surface of a base disk and having a hole of a predetermined radius formed in a center portion thereof, and the base disk has a plurality of grooves equiangularly provided in the major surface thereof as extending radially outward from a center portion thereof.
This arrangement ensures stable supply of an abrasive liquid, and obviates a need for formation of grooves in the viscoelastic layer.

摘要翻译： 用于抛光的粘弹性抛光机。 粘弹性抛光机包括设置在基盘的主表面上并具有形成在其中心部分的具有预定半径的孔的粘弹性层，并且基盘具有在其主表面上等角地设置为沿径向延伸的多个槽 从其中心部分向外。 这种布置确保了磨料液体的稳定供应，并且避免了在粘弹性层中形成凹槽的需要。