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    BEAM POSITION MONITOR DEVICE AND PARTICLE RAY TREATMENT DEVICE
    1.
    发明公开
    BEAM POSITION MONITOR DEVICE AND PARTICLE RAY TREATMENT DEVICE 审中-公开
    光位置检测装置及粒子射线治疗UNIT

    公开(公告)号：EP2639598A4

    公开(公告)日：2015-07-01

    申请号：EP12769303

    申请日：2012-01-20

    申请人： MITSUBISHI ELECTRIC CORP

    发明人： HONDA TAIZO ,  HARADA HISASHI ,  PU YUEHU ,  IKEDA MASAHIRO ,  HANAKAWA KAZUSHI ,  OTANI TOSHIHIRO ,  KATAYOSE TADASHI ,  YAMADA YUKIKO

    IPC分类号： G01T1/29 ,  G21K5/04

    CPC分类号： A61N5/1048 ,  A61N5/1043 ,  A61N5/1071 ,  A61N2005/1074 ,  A61N2005/1087 ,  G01T1/29 ,  G21K5/00 ,  G21K5/02

    摘要： The objective is to shorten the obtaining cycle for a charged particle beam irradiation position even in the case where radiations, emitted when a charged particle beam is irradiated, provide an effect. The beam position monitor (30) is provided with a plurality of position monitors (4) and a beam data processing device (11) that performs calculation processing of the state of a charged particle beam (1), based on a plurality of signals outputted from the position monitors. The beam data processing device (11) includes a plurality of channel data conversion units (21) that perform AD conversion processing of the plurality of signals outputted from the position monitors (4); a position size processing unit (23), for each of the position monitors (4), that calculates the beam position of the beam (1), based on voltage information obtained through the AD conversion processing; and an integrated control unit (40) that controls the plurality of channel data conversion units (21) in such a way that while the beam (1) is irradiated onto an irradiation subject (15), AD conversion processing of the signals is performed at different timings for the respective position monitors (4).

    PARTICLE BEAM THERAPY DEVICE AND PARTICLE BEAM THERAPY DEVICE OPERATION METHOD
    2.
    发明公开
    PARTICLE BEAM THERAPY DEVICE AND PARTICLE BEAM THERAPY DEVICE OPERATION METHOD 审中-公开
    用于粒子治疗装置的粒子射线治疗装置和操作方法

    公开(公告)号：EP2832399A4

    公开(公告)日：2015-11-25

    申请号：EP12872609

    申请日：2012-03-27

    申请人： MITSUBISHI ELECTRIC CORP

    发明人： YAMADA YUKIKO ,  HARADA HISASHI ,  HONDA TAIZO ,  IKEDA MASAHIRO ,  HANAKAWA KAZUSHI ,  OTANI TOSHIHIRO ,  KATAYOSE TADASHI

    IPC分类号： A61N5/10 ,  H05H7/10

    CPC分类号： A61N5/1048 ,  A61N5/1043 ,  A61N5/1077 ,  A61N2005/1074 ,  A61N2005/1087 ,  H05H13/04 ,  H05H2277/11

    摘要： It is so configured that a control unit(20) is provided with, an operation pattern retaining section(25) that retains a plurality of operation patterns(OP-S,OP-L) each given as a pattern of operation to be periodically repeated by an accelerator(10), the operation patterns having respective operation conditions adjusted to have different times (To) that allow emission of an particle beam B, and to cause a deflection electromagnet(13) in the accelerator(10) to have an intended magnetic field intensity even under a presence of a hysteresis; an irradiation condition reading section(22) for a plurality of slices resulted from partitioning an irradiation target in a depth direction, that reads an irradiation condition for each of the slices; an operation pattern selection section(23) that selects the operation pattern suitable for each of the slices from among the plurality of operation patterns, on the basis of the read irradiation condition; and a main control section(21) that controls, for each of the slices, the accelerator(10) on the basis of the selected operation pattern and an irradiation device(40) on the basis of the irradiation condition.

    摘要翻译： 配置有控制单元（20），具有保持多个操作模式（OP-S，OP-L）的操作模式保持部（25），每个操作模式（OP-S，OP-L）作为周期性重复的操作模式 通过加速器（10），具有被调整为具有允许发射粒子束B的不同时间（To）并且使加速器（10）中的偏转电磁体（13）具有期望的操作条件的操作模式 甚至在磁滞的存在下的磁场强度; 用于对深度方向分割照射目标而产生的多个切片的照射条件读取部分（22），其读取每个切片的照射条件; 根据读取的照射条件，从多个操作模式中选择适合于每个切片的操作模式的操作模式选择部分（23）; 以及主控制部（21），其基于所选择的操作模式对照每个切片加速器（10），并且基于照射条件控制照射装置（40）。