公开(公告)号：EP3323910A1

公开(公告)日：2018-05-23

申请号：EP16200092.1

申请日：2016-11-22

申请人： MacDermid Enthone GmbH

发明人： Noffke, Frank ,  Werner, Christoph ,  Königshofen, Andreas

IPC分类号： C23C18/20 ,  C23C18/24 ,  C23C18/30 ,  C23C18/34

CPC分类号： C23C18/208 ,  C23C18/24 ,  C23C18/30 ,  C23C18/34

摘要： The present invention relates to a chrome free etch for plating on plastic processes, wherein plastic surfaces are contacted in a first etching step with an etching solution at least comprising Mn(IV)-ions and, in a second etching step, with a solution at least comprising Mn(III)- and Mn(VII)-ions prior to the metal plating step.

公开(公告)号：EP3323910B1

公开(公告)日：2018-11-14

申请号：EP16200092.1

申请日：2016-11-22

申请人： MacDermid Enthone GmbH

发明人： Noffke, Frank ,  Werner, Christoph ,  Königshofen, Andreas

IPC分类号： C23C18/20 ,  C23C18/24 ,  C23C18/30 ,  C23C18/34

CPC分类号： C23C18/208 ,  C23C18/24 ,  C23C18/30 ,  C23C18/34

摘要： The present invention relates to a chrome free etch for plating on plastic processes, wherein plastic surfaces are contacted in a first etching step with an etching solution at least comprising Mn(IV)-ions and, in a second etching step, with a solution at least comprising Mn(III)- and Mn(VII)-ions prior to the metal plating step.