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    PH ADJUSTING SYSTEM AND METHOD OF ADJUSTING PH
    2.
    发明公开
    PH ADJUSTING SYSTEM AND METHOD OF ADJUSTING PH 有权
    PH-JUSTIERSYS UND VERFAHREN ZUR PH-JUSTIERUNG

    公开(公告)号：EP2224452A1

    公开(公告)日：2010-09-01

    申请号：EP08712107.5

    申请日：2008-02-28

    申请人： Mitsubishi Heavy Industries, Ltd.

    发明人： SANO, Hiroshi ,  OGINO, Takafumi ,  TANIGAWA, Yoshiyuki ,  KATO, Shiro

    IPC分类号： G21C9/004 ,  G21C15/18 ,  G21F9/02

    CPC分类号： G21C9/004 ,  G21C15/18 ,  G21C17/0225 ,  G21D1/02 ,  G21Y2002/201 ,  G21Y2002/304 ,  G21Y2004/30 ,  Y02E30/40

    摘要： A pH adjusting system includes a water pit for refuelling 35 that is disposed in a reactor container 10, which stores a reactor, and is capable of storing cooling water and a pH adjusting apparatus 37 that is disposed above the water pit for refueling 35 and houses a pH adjuster. The pH adjusting apparatus 37 causes a pH-adjusted solution generated by dissolving or mixing the pH adjuster to flow out to the water pit for refueling 35 below the pH adjusting apparatus 37. Consequently, even when it is difficult to dispose the pH adjusting apparatus on a floor of the water pit for refueling, it is possible to suitably perform pH adjustment in the reactor container 10.

    摘要翻译： pH调节系统包括设置在反应器容器10中的加油水槽35，其存储反应器，并且能够储存冷却水和设置在用于加油的水坑35的上方的pH调节装置35和房屋 pH调节剂。 pH调节装置37使通过溶解或混合pH调节剂而产生的pH调节溶液流出到pH调节装置37以下的加水槽35的水坑。因此，即使难以将pH调节装置配置在 用于加油的水坑的地板，可以在反应容器10中适当地进行pH调节。

    LIQUID LEVEL DETECTION DEVICE OF LIQUID SUPPLYING APPARATUS, LIQUID LEVEL DETECTION METHOD FOR LIQUID SUPPLYING APPARATUS, AND LIQUID SUPPLYING APPARATUS EQUIPPED WITH SUCH LIQUID LEVEL DETECTION DEVICE
    3.
    发明公开
    LIQUID LEVEL DETECTION DEVICE OF LIQUID SUPPLYING APPARATUS, LIQUID LEVEL DETECTION METHOD FOR LIQUID SUPPLYING APPARATUS, AND LIQUID SUPPLYING APPARATUS EQUIPPED WITH SUCH LIQUID LEVEL DETECTION DEVICE 审中-公开

    公开(公告)号：EP3396333A1

    公开(公告)日：2018-10-31

    申请号：EP16888044.1

    申请日：2016-09-21

    申请人： Mitsubishi Heavy Industries, Ltd.

    发明人： ASAHARA, Taiki ,  SAKATA, Hideyuki ,  OGINO, Takafumi

    IPC分类号： G01F23/18 ,  G01F1/00

    CPC分类号： G01F23/18 ,  G01F1/007

    摘要： A liquid supplying facility includes: a tank in which a liquid is stored and a high-pressure gas is enclosed; a discharge pipe for discharging the liquid in the tank to outside with the high-pressure gas; and a valve, disposed in the discharge pipe, for switching a communication state between the tank and the outside. A liquid level detection device for the liquid supplying facility includes: a lower pipe which is in communication with a liquid-phase section of an interior space of the tank, the liquid-phase section being occupied by the liquid; an upper pipe which is in communication with a gas-phase section of the interior space of the tank, the gas-phase section being disposed above the liquid-phase section and occupied by the high-pressure gas; a differential pressure gauge for detecting a differential pressure between the lower pipe and the upper pipe; and a liquid level calculation part for calculating a liquid level of the tank on the basis of a differential pressure detection result of the differential pressure gauge. An inside of the upper pipe is filled with a filling liquid at least in a partial range.

    PH ADJUSTING UNIT
    5.
    发明公开
    PH ADJUSTING UNIT 有权
    PH-EINSTELLEINHEIT

    公开(公告)号：EP2224453A1

    公开(公告)日：2010-09-01

    申请号：EP08712108.3

    申请日：2008-02-28

    申请人： Mitsubishi Heavy Industries, Ltd.

    发明人： SANO, Hiroshi ,  OGINO, Takafumi ,  TANIGAWA, Yoshiyuki ,  KATO, Shiro

    IPC分类号： G21C9/004 ,  G21C15/18 ,  G21F9/02

    CPC分类号： G21C9/004 ,  C02F1/66 ,  C02F1/688 ,  C02F2101/006 ,  C02F2101/12 ,  C02F2103/023 ,  G21C15/18 ,  G21C17/0225 ,  G21D1/02 ,  G21Y2002/201 ,  G21Y2002/304 ,  G21Y2004/30 ,  Y02E30/40

    摘要： A pH adjusting apparatus arranged above a water pit for refueling disposed in a reactor container that stores a nuclear reactor includes a pH adjuster, a basket 50 that contains the pH adjuster, and a basket housing container 51 that houses the basket 50 therein and has formed therein an inlet through which a solvent for dissolving or diluting the pH adjuster flows in and an overflow pipe 52 through which a pH-adjusted solution generated by dissolving or mixing the pH adjuster in the solvent flows out to the water pit for refueling. Consequently, even if it is difficult to dispose the basket 50 on a floor of the water pit for refueling, it is possible to suitably perform pH adjustment in the reactor container.

    摘要翻译： 设置在储存核反应堆的反应器容器中的用于加油的水坑上方的pH调节装置包括pH调节器，包含pH调节器的筐50，以及容纳筐体50并形成的筐收纳容器51 其中具有用于溶解或稀释pH调节剂的溶剂流过的入口和通过将pH调节剂溶解或混合在溶剂中而产生的pH调节溶液流过的溢流管52流出到用于加油的水坑。 因此，即使难以将筐50配置在用于加油的水坑的地板上，也可以适当地进行反应容器的pH调节。

    FLOW DAMPER, PRESSURE ACCUMULATION AND WATER INJECTION DEVICE, AND NUCLEAR POWER EQUIPMENT
    6.
    发明公开
    FLOW DAMPER, PRESSURE ACCUMULATION AND WATER INJECTION DEVICE, AND NUCLEAR POWER EQUIPMENT 有权
    流动阻尼器，压力积蓄和注水装置，以及核动力设备

    公开(公告)号：EP3316264A1

    公开(公告)日：2018-05-02

    申请号：EP17750100.4

    申请日：2017-01-27

    申请人： Mitsubishi Heavy Industries, Ltd.

    发明人： IINO, Masamichi ,  HIRAI, Shigeto ,  ASAHARA, Taiki ,  OGINO, Takafumi ,  KIRITA, Akira ,  TODA, Akihiro ,  SAKATA, Hideyuki ,  TANAKA, Yutaka ,  TOKUNAGA, Setsuo ,  NAKAHARA, Takashi ,  OKAZAKI, Takanori

    IPC分类号： G21C15/18

    CPC分类号： G21C15/182 ,  F15C1/16 ,  G21C1/18 ,  G21C15/18 ,  G21C15/243 ,  Y02E30/40

    摘要： To provide a flow damper 34 including a cylindrical vortex chamber 35, a small flow-rate pipe connected to a peripheral plate 35C of the vortex chamber 35 along a tangential direction thereof, a large flow-rate pipe connected to the peripheral plate 35C with a predetermined angle with respect to the small flow-rate pipe, an outlet pipe connected to an outlet formed in a central part of the vortex chamber 35, and a pressure equalization pipe 50 with respective ends 50A being connected to the peripheral plate 35C on opposite sides of the outlet and at positions closer to a connection portion between the small flow-rate pipe and the large flow-rate pipe than positions facing each other, putting the outlet therebetween. The pressure equalization pipe 50 is arranged such that at least a part thereof is located at a higher position than a top plate 35A of the vortex chamber 35, and an outgassing hole 51 is provided at an uppermost part 50D of the pressure equalization pipe 50.

    摘要翻译： 为了提供包括圆柱形涡流室35的流动阻尼器34，沿其切线方向连接到涡流室35的外围板35C的小流量管，连接到外围板35C的大流量管 相对于小流量管的预定角度，与形成在涡流室35的中心部分中的出口连接的出口管，以及均压管50，该压力平衡管50的相应端部50A在相对侧上连接到外围板35C 并且在比小型流量管和大流量管之间的连接部分更靠近彼此面对的位置的位置处，将出口置于其间。 均压配管50的至少一部分位于比涡流室35的顶板35A靠上方的位置，在均压配管50的最上部50D设置有排气孔51。