摘要:
A semiconductor laser comprises first and second distributed Bragg reflector diffraction gratings (10a,10b) being intervened by an active region having no diffraction grating; said first and second diffraction gratings (10a,10b) each have a plurality of repeating unit regions repeated at respective periods, thus forming respective modulation periods (Mf,Mr); in each of the repeating unit regions the length of the single period varies in the direction in which light transmits, continuously or at intervals, thereby varying the optical reflectivity of the diffraction gratings (10a,10b) depending on its position in each of its said repeating unit regions; said first and second diffraction gratings reflect light having wavelengths (λ 1 ,λ 2 ,.. and λ' 1 ,λ 2 ,...) slightly differing from each other; and said diffraction grating extends by at least two modulation periods. The application of voltages on said diffraction gratings enables coarse and fine tuning of lasing the wavelength.
摘要:
A semiconductor laser comprises first and second distributed Bragg reflector diffraction gratings (10a,10b) being intervened by an active region having no diffraction grating; said first and second diffraction gratings (10a,10b) each have a plurality of repeating unit regions repeated at respective periods, thus forming respective modulation periods (Mf,Mr); in each of the repeating unit regions the length of the single period varies in the direction in which light transmits, continuously or at intervals, thereby varying the optical reflectivity of the diffraction gratings (10a,10b) depending on its position in each of its said repeating unit regions; said first and second diffraction gratings reflect light having wavelengths (λ 1 ,λ 2 ,.. and λ' 1 ,λ 2 ,...) slightly differing from each other; and said diffraction grating extends by at least two modulation periods. The application of voltages on said diffraction gratings enables coarse and fine tuning of lasing the wavelength.
摘要:
The distributed reflector includes a substrate (1) and at least one optical waveguide formed on the substrate and having a refractive index larger than the substrate and at least one optical confinement layer (3) having a refractive index smaller than the optical waveguide layer. A diffractive grating (10a or 10b) is formed in at least one layer (2 or 3) constituting the optical waveguide. The diffractive grating has a structure of which at least one parameter defining optical reflectivity varies depending on its position, and is formed continuously for at least two periods, the period being approximately defined by the length of repeating unit region. The parameter may be pitch, coupling coefficient, bandgap composition, phase shift, etc. The semiconductor laser includes the distributed reflector which may be of a distributed reflector type or distributed feed back type and has distributed reflector regions (102, 103) and a phase adjustment region (104). The laser also has a cladding layer (4), a cap layer (5), current block layers (6, 7), electrodes (8, 9), connection portions (11), and grooves (30). Application of current or voltage to the refractive index of the active region (101) or inactive region (102, 103, 104) in which a diffractive grating is present or absent adjusts the refractive index thereof and enables coarse and fine adjustment of lasing wavelength. Comb-shaped electrodes may be used.
摘要:
The distributed reflector includes a substrate (1) and at least one optical waveguide formed on the substrate and having a refractive index larger than the substrate and at least one optical confinement layer (3) having a refractive index smaller than the optical waveguide layer. A diffractive grating (10a or 10b) is formed in at least one layer (2 or 3) constituting the optical waveguide. The diffractive grating has a structure of which at least one parameter defining optical reflectivity varies depending on its position, and is formed continuously for at least two periods, the period being approximately defined by the length of repeating unit region. The parameter may be pitch, coupling coefficient, bandgap composition, phase shift, etc. The semiconductor laser includes the distributed reflector which may be of a distributed reflector type or distributed feed back type and has distributed reflector regions (102, 103) and a phase adjustment region (104). The laser also has a cladding layer (4), a cap layer (5), current block layers (6, 7), electrodes (8, 9), connection portions (11), and grooves (30). Application of current or voltage to the refractive index of the active region (101) or inactive region (102, 103, 104) in which a diffractive grating is present or absent adjusts the refractive index thereof and enables coarse and fine adjustment of lasing wavelength. Comb-shaped electrodes may be used.