公开(公告)号：EP2486378A1

公开(公告)日：2012-08-15

申请号：EP10822422.1

申请日：2010-09-22

Applicant: Nanometrics Incorporated

Inventor： RABELLO, Silvio, J. ,  MCGAHAN, William, A. ,  LI, Jie ,  LIU, Yongdong

IPC: G01J4/00

CPC classification number: G01N21/211 ,  G01B11/24 ,  G01B2210/56 ,  G01N2021/213 ,  G01N2021/214 ,  G03F7/70633

Abstract: Asymmetry metrology is performed using at least a portion of Mueller matrix elements, including, e.g., the off-diagonal elements of the Mueller matrix. The Mueller matrix may be generated using, e.g., a spectroscopic or angle resolved ellipsometer that may include a rotating compensator. The Mueller matrix is analyzed by fitting at least a portion of the elements to Mueller matrix elements calculated using a rigorous electromagnetic model of the sample or by fitting the off-diagonal elements to a calibrated linear response. The use of the Mueller matrix elements in the asymmetry measurement permits, e.g., overlay analysis using in-chip devices thereby avoiding the need for special off-chip targets.

Abstract translation: 使用至少一部分Mueller矩阵元素（包括例如Mueller矩阵的非对角元素）来执行不对称度量。 可以使用例如可以包括旋转补偿器（122）的分光或角度分辨椭圆计（100）来产生穆勒矩阵。 通过将至少一部分元素拟合到使用样本（101）的严格电磁模型计算的穆勒矩阵元素或通过将非对角线元素拟合到校准的线性响应来分析穆勒矩阵。 在不对称测量中使用Mueller矩阵元件允许例如使用芯片内器件的叠加分析，从而避免需要特殊的芯片外目标。

公开(公告)号：EP3910285A1

公开(公告)日：2021-11-17

申请号：EP21175735.6

申请日：2010-09-22

Applicant: Nanometrics Incorporated

Inventor： RABELLO, Silvio J. ,  MCGAHAN, William A. ,  LI, Jie ,  LIU, Yongdong

IPC: G01B11/24 ,  G01N21/21 ,  G01J4/00

Abstract: Asymmetry metrology is performed using at least a portion of Mueller matrix elements, including, e.g., the off-diagonal elements of the Mueller matrix. The Mueller matrix may be generated using, e.g., a spectroscopic or angle resolved ellipsometer (100) that may include a rotating compensator (122). The Mueller matrix is analyzed by fitting at least a portion of the elements to Mueller matrix elements calculated using a rigorous electromagnetic model of the sample (101) or by fitting the off-diagonal elements to a calibrated linear response. The use of the Mueller matrix elements in the asymmetry measurement permits, e.g., overlay analysis using in-chip devices thereby avoiding the need for special off-chip targets.