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    METHOD FOR ARRANGING SELF-SCANNING LIGHT EMITTING ELEMENT ARRAY CHIP
    1.
    发明公开
    METHOD FOR ARRANGING SELF-SCANNING LIGHT EMITTING ELEMENT ARRAY CHIP 审中-公开
    方法用于布置芯片的自扫描型发光元件的矩阵

    公开(公告)号：EP1142720A1

    公开(公告)日：2001-10-10

    申请号：EP00961048.6

    申请日：2000-09-18

    申请人： Nippon Sheet Glass Co., Ltd.

    发明人： OHNO, Seiji, Nippon Sheet Glass Co., Ltd.

    IPC分类号： B41J2/44 ,  B41J2/45 ,  B41J2/455 ,  H01L33/00 ,  H01L25/04 ,  H01L27/15 ,  H01L25/18

    CPC分类号： B41J2/45 ,  B41J2002/453 ,  Y10S438/975

    摘要： A method of arraying self-scanning light-emitting element array chips is provided, in which it is possible to remove defective chips completely. A plurality of self-scanning light-emitting array chips in a zigzag manner on a substrate, each chip being rectangular and comprising an array of light-emitting elements arrayed in a line facing to one end of the chip and a plurality of bonding pads provided on the other end of the chip. The plurality of chips are arrayed in such a manner that one ends of neighboring chips are arranged without overlapping in an array direction of chips so that an array pitch of chips is constant, and the other ends of the chips are arranged with overlapping in a direction perpendicular to an array direction of chips so that an array pitch of chips is constant.

    METHOD FOR SETTING QUANTITY OF LIGHT OF LIGHT-EMITTING ELEMENT ARRAY
    2.
    发明公开
    METHOD FOR SETTING QUANTITY OF LIGHT OF LIGHT-EMITTING ELEMENT ARRAY 审中-公开
    VERFAHREN ZUR STEUERUNG DER LICHTMENGE EINER ANORDNUNG VON LICHTEMITTIERENDEN ELEMENTEN

    公开(公告)号：EP1167048A1

    公开(公告)日：2002-01-02

    申请号：EP01901486.9

    申请日：2001-01-22

    申请人： Nippon Sheet Glass Co., Ltd.

    发明人： OHNO, Seiji, Nippon Sheet Glass Co., Ltd. ,  KUSUDA, Yukihisa, Nippon Sheet Glass Co., Ltd. ,  OHTSUKA, Shunsuke, Nippon Sheet Glass Co., Ltd. ,  KURODA, Yasunao, Nippon Sheet Glass Co., Ltd. ,  ARIMA, Takahisa, Nippon Sheet Glass Co., Ltd. ,  SAITOU, Hideaki, Nippon Sheet Glass Co., Ltd.

    IPC分类号： B41J2/45 ,  H01L33/00

    CPC分类号： B41J2/45

    摘要： A method for setting the amount of light in an array of light-emitting thyristors, each thyristor having I-L characteristic in which a luminous efficiency is decreased in a lower current field, is provided. According to the method, the amount of light emitted from a light-emitting thyristor is set so that a predetermined exposure energy may be obtained without decreasing a luminous efficiency of a light-emitting thyristor. The density D of a current to be supplied to the light-emitting thyristor to obtain a predetermined exposure energy is selected so as to satisfy the range of 3 × D th 2 , wherein D th is a threshold current density for light emission which is defined as a current density corresponding to the value of a current at a point where a tangent drawn at the value of a current corresponding to a current density of 50MA/m 2 with respect to the curve of the I-L characteristic intersects a current axis.

    摘要翻译： 提供了一种用于设置发光晶闸管阵列中的光量的方法，每个晶闸管具有在较低电流场中发光效率降低的具有I-L特性的晶闸管。 根据该方法，从发光晶闸管发射的光量被设定为能够在不降低发光晶闸管的发光效率的情况下获得预定的曝光能量。 选择要供给到发光晶闸管以获得预定曝光能量的电流的密度D，以满足3×Dth

    METHOD FOR DESIGNING MASK PATTERN OF SELF SCANNING LIGHT EMITTING DEVICE
    3.
    发明公开
    METHOD FOR DESIGNING MASK PATTERN OF SELF SCANNING LIGHT EMITTING DEVICE 审中-公开
    ENTWURFSVERFAHRENFüREIN MASKENMUSTER VON EINEM SELBSTABTASTENDEN LICHTEMITTIERENDEN BAUELEMENT

    公开(公告)号：EP1143523A1

    公开(公告)日：2001-10-10

    申请号：EP00956928.6

    申请日：2000-09-05

    申请人： Nippon Sheet Glass Co., Ltd.

    发明人： KUSUDA, Yukihisa, Nippon Sheet Glass Co., Ltd. ,  OHTSUKA, Shunsuke, Nippon Sheet Glass Co., Ltd. ,  OHNO, Seiji, Nippon Sheet Glass Co., Ltd.

    IPC分类号： H01L27/15 ,  H01L33/00 ,  H01L21/3205 ,  H01L21/768

    CPC分类号： B41J2/45 ,  B41J2002/453 ,  H01L27/156

    摘要： A method of designing an optimum mask pattern for forming a metal line by an etchinf process, the metal line also effectively serving as a light-shielding layer, is provided. In this method, assuming that a mask pattern for forming a first metal line on a transparent insulating film has a width of "L1" overlapped with a first control electrode in a direction perpendicular to an array direction of transfer elements, 'L1" is selected so as to satisfy the following relation L1>(S+dS)+a, wherein "s" is the distance of side etching of the first metal line, "ds" is the dispersion of the distance of the side etching, and "a" is the misalignment of the mask pattern

    摘要翻译： 提供了一种通过蚀刻工艺设计用于形成金属线的最佳掩模图案的方法，还有效地用作遮光层的金属线。 在该方法中，假定在透明绝缘膜上形成第一金属线的掩模图案在与传送元件的排列方向垂直的方向上具有与第一控制电极重叠的宽度“L1”，选择“L1” 以满足下列关系式L1>（S + dS）+ a，其中“s”为第一金属线的侧蚀刻距离，“ds”为侧面蚀刻距离的分散，“a “是掩模图案的未对准

    SELF-SCANNING LIGHT-EMITTING DEVICE
    5.
    发明公开
    SELF-SCANNING LIGHT-EMITTING DEVICE 审中-公开
    自我扫描发光装置

    公开(公告)号：EP1123808A1

    公开(公告)日：2001-08-16

    申请号：EP00954916.3

    申请日：2000-08-23

    申请人： Nippon Sheet Glass Co., Ltd.

    发明人： OHNO, Seiji, Nippon Sheet Glass Co., Ltd. ,  KUSUDA, Yukihisa, Nippon Sheet Glass Co., Ltd. ,  YOSHIDA, Harunobu, Nippon Sheet Glass Co., Ltd. ,  YAMASHITA, Ken, Nippon Sheet Glass Co., Ltd.

    IPC分类号： B41J2/45

    CPC分类号： B41J2/45 ,  B41J2002/453

    摘要： A self-scanning light-emitting device is provided in which the amounts of light of light-emitting elements may be corrected to make the distribution of amounts of light in a luminescent chip or among luminescent chips uniform. The correction for amounts of light of light-emitting elements may be carried out by regulating the time duration of on-state of a light-emitting element or the voltage of a write signal applied to a light-emitting element. According to the present invention, the distribution of amounts of light becomes uniform, so that the printing quality of a printer using such self-scanning light-emitting device is improved.

    摘要翻译： 提供了一种自扫描发光装置，其中可以校正发光元件的光量以使发光芯片中或发光芯片中的光量分布均匀。 发光元件的光量校正可以通过调节发光元件的接通状态的持续时间或施加到发光元件的写入信号的电压来执行。 根据本发明，光量的分布变得均匀，使得使用这种自扫描发光装置的打印机的打印质量得到改善。