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1.发明公开
公开(公告)号：EP2091053A3
公开(公告)日：2010-02-17
申请号：EP09162113.6
申请日：2004-11-18
CPC分类号： H01L31/1884 , C03C15/00 , C03C17/22 , C03C2217/77 , H01L31/02366 , Y02E10/50 , Y10T428/24975 , Y10T428/265
摘要： The present invention provides a transparent substrate with a transparent conductive film that is thin but has a surface with concavities and convexities of increased height. A manufacturing method of the present invention includes a process of forming a transparent conductive film containing crystalline metal oxide as its main component on a transparent substrate by a pyrolytic oxidation method. In the method, a gaseous material containing a metal compound, an oxidizing material, and hydrogen chloride is supplied onto the transparent substrate. The process includes sequentially: a first step in which a mole ratio of the hydrogen chloride to the metal compound in the gaseous material is 0.5 to 5; and a second step in which the mole ratio is 2 to 10 and is higher than the mole ratio to be employed in the first step. With the present invention, a transparent substrate with a transparent conductive film can be provided that has a haze ratio of at least 15% and includes a transparent conductive film whose thickness is 300 nm to 750 nm.
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2.发明公开
公开(公告)号：EP2091053A2
公开(公告)日：2009-08-19
申请号：EP09162113.6
申请日：2004-11-18
CPC分类号： H01L31/1884 , C03C15/00 , C03C17/22 , C03C2217/77 , H01L31/02366 , Y02E10/50 , Y10T428/24975 , Y10T428/265
摘要： The present invention provides a transparent substrate with a transparent conductive film that is thin but has a surface with concavities and convexities of increased height. A manufacturing method of the present invention includes a process of forming a transparent conductive film containing crystalline metal oxide as its main component on a transparent substrate by a pyrolytic oxidation method. In the method, a gaseous material containing a metal compound, an oxidizing material, and hydrogen chloride is supplied onto the transparent substrate. The process includes sequentially: a first step in which a mole ratio of the hydrogen chloride to the metal compound in the gaseous material is 0.5 to 5; and a second step in which the mole ratio is 2 to 10 and is higher than the mole ratio to be employed in the first step. With the present invention, a transparent substrate with a transparent conductive film can be provided that has a haze ratio of at least 15% and includes a transparent conductive film whose thickness is 300 nm to 750 nm.
摘要翻译： 本发明提供一种具有透明导电膜的透明基板，该透明导电膜薄但具有增加高度的凹凸的表面。 本发明的制造方法包括通过热解氧化法在透明基板上形成含有结晶金属氧化物作为主要成分的透明导电膜的工序。 在该方法中，将含有金属化合物，氧化物质和氯化氢的气态物质供给到透明基板上。 该方法依次包括：气态物质中氯化氢与金属化合物的摩尔比为0.5-5的第一步骤; 摩尔比为2〜10，高于第1工序中使用的摩尔比的第2工序。 通过本发明，可以提供具有至少15％的雾度比的具有透明导电膜的透明基板，并且包括厚度为300nm至750nm的透明导电膜。
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